Method and device for reducing photomask stripes
A mask and stripe technology, applied in the field of photomask production, can solve the problems of stripes on the photomask and errors in the manufacturing process of the photomask, and achieve the effect of reducing the occurrence of stripes
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Embodiment 1
[0045] figure 1 The implementation flow of the method for reducing photomask stripes provided by the first embodiment of the present invention is shown, and the details are as follows:
[0046] In S101 , measure the variation curve of the overlapping pattern accuracy of the pixel pattern and the overlapping portion of the scan zone through the photomask inspection board.
[0047] Since the scanning zone and the pixel pattern of the lithography machine equipment show periodic changes, when the overlapping area of the two scanning zones overlaps with the edge of the pixel pattern, the stripes of the photomask will appear in the production, specifically The maximum width of the scanning zone of the lithography equipment is fixed. In the vertical direction of the scanning zone, the energy exposed to the entire photomask also changes periodically. The specific exposure energy cycle of the lithography equipment is as follows: figure 2 As shown, that is, the overlapping area with...
Embodiment 2
[0056] Figure 6 It shows the implementation flowchart of reducing photomask stripes provided by the second embodiment of the present invention, and the details are as follows:
[0057] S601. According to the spot size of the lithography machine equipment and the number of beams, calculate the pattern contraction coefficient of the fringe caused by the energy difference of the beams of each pixel pattern.
[0058] Due to the lithography machine with multiple beams, for the lithography machine with multiple beams, the energy of the beams will be different between the multiple beams. When different beams are finally lithography, the difference in beam energy will cause There are differences in the exposed photomasks, resulting in stripes on the final photomask. Therefore, for multi-beam lithography equipment, calculate the graphics of each pixel pattern due to the difference in beam energy according to the spot size of the lithography equipment and the number of beams. shrinkag...
Embodiment 3
[0064] Figure 7 A flow chart of realizing the reduction of photomask stripes provided by the third embodiment of the present invention is shown. For the convenience of description, only the parts related to the embodiment of the present invention are shown.
[0065] S701, design and manufacture photomask inspection board;
[0066] Among them, the photomask inspection board is designed with the smallest seam with the highest design capability of photomask manufacturing equipment or flat panel display exposure equipment.
[0067] S702. Perform matrix measurement on the gluing of the photomask or the light intensity in different regions through the photomask inspection board according to the division interval, measure each matrix point, and obtain the deviation of each matrix point.
[0068] The matrix measurement of the whole plate is carried out according to the interval of 5mm-20mm. For example, for 700X800, the window size of the exposure machine is 600X700. According to th...
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