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Exposure device, method for manufacturing flat panel display, and method for manufacturing device

A technology of exposure device and horizontal plane, which is applied in semiconductor/solid-state device manufacturing, exposure device for photoengraving process, photoengraving process of pattern surface, etc., can solve problems such as workability deterioration and cost increase of exposure device.

Active Publication Date: 2014-12-10
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the above-mentioned exposure device of Patent Document 1, since the weight offset device moves in a large range corresponding to the step scanning, it is necessary to make the flatness of the upper surface of the platform (the moving guide surface of the weight offset device) high in a large range.
In addition, in recent years, the substrate to be exposed by the exposure device tends to be larger and larger, and the platform is also larger accordingly. Therefore, in addition to the increase in cost, the transportability of the exposure device and the deterioration of the workability during mounting are all affected. care

Method used

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  • Exposure device, method for manufacturing flat panel display, and method for manufacturing device
  • Exposure device, method for manufacturing flat panel display, and method for manufacturing device
  • Exposure device, method for manufacturing flat panel display, and method for manufacturing device

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Embodiment Construction

[0033] "First Embodiment"

[0034] Below, according to Figure 1 to Figure 6 In Part B, the first embodiment is described.

[0035] figure 1 The structure of the exposure apparatus 10 of 1st Embodiment is shown schematically in FIG. The exposure device 10 is a step-and-scan projection exposure device (also referred to as a scanner) using a rectangular (square) glass substrate P (hereinafter, simply referred to as the substrate P) used in a liquid crystal display device (flat panel display) as an exposure object.

[0036]Exposure apparatus 10, substrate stage device PST including an illumination system IOP, a mask stage MST holding a mask M, a projection optical system PL, a pair of substrate stage stages 33, a substrate holder 31 holding a substrate P, and Such control system etc. Hereinafter, the direction in which the mask M and the substrate P are scanned relative to the projection optical system 16 during exposure is referred to as the X-axis direction, the direction p...

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Abstract

In a substrate stage device (PST), an X movable element (56), which faces an X stator (82) provided on an X beam (25) and in which a magnetic attractive force is generated with respect to a weight canceling device (50), is fixed at the tip of an arm (54) of the weight canceling device (50). The weight canceling device (50) transfers its own weight and part of the weight of a micro-movement stage (30) that the weight canceling device (50) supports to a floor (11) via a base frame (14) by means of the magnetic attractive force. Therefore, the biased load applied to a vibration prevention device (34) is reduced.

Description

technical field [0001] The present invention relates to an exposure device, a method for manufacturing a flat-panel display, and a method for manufacturing an element. Specifically, it relates to an exposure device used in a photolithography process for manufacturing semiconductor elements, liquid crystal display elements, and the like, and a flat-panel display using the aforementioned exposure device. and a method of manufacturing an element using the aforementioned exposure apparatus. Background technique [0002] So far, in the photolithography process of manufacturing electronic components (micro components) such as liquid crystal display elements, semiconductor elements (integrated circuits, etc.), a mask or reticle (hereinafter collectively referred to as "mask") and A glass plate or wafer (hereinafter referred to as "substrate") moves synchronously along a predetermined scanning direction (scan direction), while transferring the pattern formed on the mask to the subst...

Claims

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Application Information

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IPC IPC(8): G03F7/20G02F1/13H01L21/027H01L21/68
CPCG02F1/13G03F7/70716G02F1/1333
Inventor 青木保夫
Owner NIKON CORP