Unlock instant, AI-driven research and patent intelligence for your innovation.

Visual feedback for inspection algorithms and filters

A filter and visual representation technology, applied in the field of inspection systems, which can solve problems such as difficulty in setting and evaluating differential filters and inspection algorithms, and inability to directly observe effects.

Inactive Publication Date: 2015-02-18
KLA TENCOR TECH CORP
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, differential filters and inspection algorithms can be difficult to set up and evaluate because the effect of selected filters or inspection algorithms on processed test and reference images cannot be directly observed

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Visual feedback for inspection algorithms and filters
  • Visual feedback for inspection algorithms and filters
  • Visual feedback for inspection algorithms and filters

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] Reference will now be made in detail to the disclosed subject matter illustrated in the accompanying drawings.

[0021] Figures 1 to 4 Systems and methods for providing visual feedback regarding the effect of selected inspection algorithms and / or differential filters on at least one set of test and reference images (hereinafter "sample images") of at least one sample are generally described. The sample image may be collected by an inspection system such as, but not limited to, a brightfield inspection system, a darkfield inspection system, or an electron beam inspection system. A visual representation of the sample image can be observed and various filters, algorithms and / or view options can be manipulated via the user interface to improve the ability to inspect and / or isolate defects. Inspection algorithm settings and / or differential filter templates may be selected based on the observed visual representation. The following examples illustrate the foregoing principl...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The disclosure is directed to providing visual feedback for inspection algorithms and difference filters used to process test and reference images from an inspection system. A user interface may be configured for displaying information and accepting user commands. A computing system communicatively coupled to the user interface may be configured to receive at least one set of test and reference images collected by the inspection system. The computing system may be further configured to provide at least one visual representation of the test and reference images via the user interface to show effects of an inspection algorithm and / or difference filter.

Description

[0001] priority [0002] This application claims that Li Hucheng (Hucheng Lee) et al. filed on May 8, 2012 entitled "DIFF FILTER AND GENERALIZED MDAT SETUP UI 61 / 644,026 of U.S. Provisional Application No. 61 / 644,026 of DESIGN), which is currently co-pending or is an application of a currently co-pending application granted the right to a filing date. technical field [0003] The present invention relates generally to the field of inspection systems, and more particularly to providing visual feedback to inspection algorithms and / or filters used to process test and reference images collected by inspection systems. Background technique [0004] Semiconductor manufacturing is moving towards smaller scale and higher complexity production. To enforce tighter specifications, inspection systems may be used at various stages before, during, and / or after the manufacturing process. In any of the foregoing stages, an inspection system (eg, brightfield inspection system, darkfield in...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L21/66H01L21/00
CPCH01L2924/0002H01L22/12H01L22/20G06T7/0004G01N21/9501G01N21/8851G01N21/956G06F18/00H01L2924/00G06T2207/30148G06T7/001G06F3/048
Inventor 李虎成黄军秦高理升
Owner KLA TENCOR TECH CORP