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Method Of Joining Semiconductor Substrate

一种半导体、基板的技术,应用在半导体器件、半导体/固态器件制造、半导体/固态器件零部件等方向,能够解决金属层回流、误差、缺陷等问题,达到防止回流的效果

Active Publication Date: 2015-07-01
HYUNDAI MOTOR CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, as reported in the related art, subtle errors may also occur
Also, alignment errors may arise due to thermal expansion during multiple bonding processes, or metal layers may reflow through heat or pressure during bonding, causing defects

Method used

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  • Method Of Joining Semiconductor Substrate
  • Method Of Joining Semiconductor Substrate
  • Method Of Joining Semiconductor Substrate

Examples

Experimental program
Comparison scheme
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Embodiment Construction

[0035] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the singular forms "a, an" and "the" are intended to include the plural forms as well, unless the context clearly dictates otherwise. It can also be understood that the terms "comprising" and / or "comprising" used in the specification refer to the presence of the stated features, integers, steps, operations, elements and / or components, but do not exclude the presence or addition of one or more Other features, integers, steps, operations, elements, parts and / or groups thereof. As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items.

[0036] Unless specifically stated or obvious from context, as used herein, the term "about" is understood as within a range of normal tolerance in the art, for example within 2 standard deviations of the mean. "About" can be un...

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PUM

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Abstract

A method of joining semiconductor substrates, which may include: forming an alignment key on a first semiconductor substrate; forming an insulating layer on the first semiconductor substrate and the alignment key; forming a first metal layer pattern and a second metal layer pattern on the insulating layer; forming a first protrusion and a second protrusion, and an alignment recess positioned between the first protrusion and the second protrusion on a second semiconductor substrate; forming a third metal layer pattern and a fourth metal layer pattern on the first protrusion and the second protrusion, respectively; and joining the first semiconductor substrate and the second semiconductor substrate, in which the alignment key is positioned at the alignment recess when the first semiconductor substrate and the second semiconductor substrate are joined, is provided.

Description

[0001] Cross References to Related Applications [0002] This application claims priority and benefit from Korean Patent Application No. 10-2013-0167810 filed in the Korean Intellectual Property Office on December 30, 2013, the entire contents of which are incorporated herein by reference. technical field [0003] The present invention relates to a bonding method of semiconductor substrates. More specifically, the present invention provides a method of bonding semiconductor substrates on which a metal layer is formed. Background technique [0004] Typically, metal layers and insulating layers are deposited or micropatterned on one semiconductor substrate to form a semiconductor device. Also, a semiconductor device may be formed by bonding two or more semiconductor substrates on which thin film layers such as metal layers and insulating layers and micropatterns may be formed. [0005] As used herein, a semiconductor substrate or wafer may be a substrate obtained by growing...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/77
CPCH01L2224/83201H01L23/544H01L2224/83902H01L2223/54426H01L21/0272H01L2224/83139H01L24/83H01L21/31144H01L21/31133H01L2224/83365H01L2224/83203H01L2224/83194H01L2224/2747H01L2224/2761H01L2224/83895H01L2224/291H01L24/27H01L24/29H01L25/50H01L2224/32145H01L24/32H01L2924/10155H01L2224/83193H01L2225/06555H01L2225/06593H01L21/20
Inventor 俞一善李熙元权纯明金炫秀
Owner HYUNDAI MOTOR CO LTD
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