Method for manufacturing black matrix

A technology of black matrix and production method, applied in nonlinear optics, instruments, optics, etc., can solve problems such as difficult identification of alignment marks

Active Publication Date: 2015-07-15
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The purpose of the present invention is to provide a method for making a black matrix, which solves the problem that the alignment marks are difficult to identify during the preparation of the black matrix in the BOA structure

Method used

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  • Method for manufacturing black matrix
  • Method for manufacturing black matrix
  • Method for manufacturing black matrix

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Embodiment Construction

[0034] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.

[0035] see Figure 4-7 As shown, the present invention provides a kind of manufacture method of black matrix, and it comprises the steps:

[0036] Step 1, such as Figure 4 As shown, a substrate 1 and a black matrix photoresist system are provided, and the black matrix photoresist system is coated on the substrate 1 to form a photoresist layer 2;

[0037] Wherein, several alignment marks 14 are arranged on the substrate 1 , and the photoresist layer 2 covers the several alignment marks 14 .

[0038] Preferably, the substrate 1 has a rectangular structure, and the alignment marks 14 are four, which are respectively arranged at four corners of the rectangle; specifically, the alignment marks 14 are in the shape of a cross.

[0039] Specifical...

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PUM

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Abstract

The invention provides a method for manufacturing a black matrix. A substrate is coated with a black matrix light resistance system containing positive photoresist, a light resistance layer formed by the black matrix light resistance system undergoes twice different exposure and developing processes by utilizing the characteristics that the positive photoresist can be removed by developing liquid in a developing process in an area irradiated by UV (Ultraviolet) rays, and thus the problem that alignment marks are difficult to identify after the black matrix light resistance system is coated in a BOA (Black matrix On Array) procedure is solved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for manufacturing a black matrix. Background technique [0002] With the development of display technology, liquid crystal displays (Liquid Crystal Display, LCD) and other flat display devices are widely used in mobile phones, televisions, personal Various consumer electronic products such as digital assistants, digital cameras, notebook computers, and desktop computers have become the mainstream of display devices. [0003] Most of the liquid crystal display devices currently on the market are backlight liquid crystal displays, which include a liquid crystal display panel and a backlight module. The working principle of the liquid crystal display panel is to place liquid crystal molecules between two parallel glass substrates. There are many vertical and horizontal small wires between the two glass substrates. The direction of the liquid crystal molecules is controlle...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1335G02F1/1333
CPCG02F1/1333G02F1/133512
Inventor 熊源许勇
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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