Method and device for liquid flow deposition of film on inner wall of silicon micro-channel by utilizing improved differential pressure method

Abstract

The invention discloses a method and a device for liquid flow deposition of a film on an inner wall of a silicon micro-channel by utilizing an improved differential pressure method. The device comprises a container, wherein a cavity of the container is divided into two cavities, namely a first cavity and a second cavity, through a partition board; a clamping groove communicated with the two cavities is arranged on the partition board between the first cavity and the second cavity; the silicon micro-channel is arranged in the clamping groove; a circulating pump is arranged between the first cavity and the second cavity, wherein a water inlet of the circulating pump is arranged at the bottom of the second cavity, and a water outlet of the circulating pump is arranged above the first cavity; and plating solution for liquid flow deposition is injected into the first cavity. The method and the device have the beneficial effects that the phenomenon that non-uniform film deposition on the inner wall of the silicon micro-channel occurs when the film deposition is carried out by the conventional deposition method and the conventional differential pressure deposition method is remarkably improved, and the silicon micro-channel subjected to film deposition by the improved differential pressure liquid flow deposition method is taken as an electrode of a lithium ion battery, so that the overall performance of the lithium ion battery can be improved.

Description

technical field [0001] The invention relates to a method and a device for depositing a thin film by liquid flow on the inner wall of a silicon microchannel by using a liquid surface pressure difference, and belongs to the field of micro-electromechanical systems. Background technique [0002] Silicon microchannel plate is a porous silicon material. Due to its special structure, it is of great significance to many scientific research fields. Among them, silicon microchannel has outstanding performance in photomultiplier and heat conduction devices, and in micro energy devices, For example, in lithium-ion batteries and supercapacitors, the excellent performance of silicon microchannel plates has gradually become prominent. How to deposit various functional materials on the side walls of silicon microchannels has also become an important research content. Existing technologies, such as sol-gel method, electroplating method, traditional electroless plating (chemical plating) me...

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Problems solved by technology

[0003] The object of the present invention is to provide a kind of method that utilizes liquid surface pressure difference to carry out liquid flow deposition thin film on silicon microchannel inner wall, is used for solving the problem that existing technology can't be deposited into uniform thin film on silicon microchannel inner wall, Apply it to micro energy devices to improve their overall performance

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