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Method for improving electro-deposition thin film quality

A technology of electrodeposition and quality, which is applied in the field of electrodeposition to achieve the effect of improving quality, uniform surface and small particles

Inactive Publication Date: 2015-11-18
LANZHOU UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In recent decades, although the method and application of electrodeposition to prepare thin films have made remarkable achi

Method used

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  • Method for improving electro-deposition thin film quality
  • Method for improving electro-deposition thin film quality
  • Method for improving electro-deposition thin film quality

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Embodiment 1: electrodeposited iron-cobalt film

[0019] Take ferrous sulfate and cobalt sulfate with a concentration of 0.1mol / L and dissolve them in 400mL of distilled water, then add additives such as 1g / L glycine, 1g / L ascorbic acid, 30g / L boric acid and 2g / L saccharin, and stir to make it clear and even . The deposited substrate is conductive glass. Electrodeposition was carried out with the solution, and an electrode plate with a potential difference of 5kV was added to both sides of the deposition electrolytic cell. An iron-cobalt thin film is deposited.

Embodiment 2

[0020] Embodiment 2: Electrodeposition of iron-cobalt thin films under different potentials

[0021] In order to verify the influence of the deposition potential on the formed film, the steps in Example 1 were implemented, only the different potentials during deposition were changed, and the potentials were respectively: 0kV, 0.6kV, 2kV, 9kV and 15kV.

[0022] The XRD collection of illustrative plates, atomic force microscope figure and scanning electron microscope figure of the sample that embodiment 1 and 2 obtain respectively refer to appendix Figures 2 to 4 .

Embodiment 3

[0023] Embodiment 3: electrodeposited iron-nickel thin film

[0024] Take ferrous sulfate and nickel sulfate with a concentration of 0.05mol / L and dissolve them in 500mL of distilled water, then add additives such as 1g / L glycine, 1g / L ascorbic acid, 30g / L boric acid and 2g / L saccharin, and stir to make it clear and even . The deposited substrate is conductive glass. Electrodeposition is carried out with the solution, and an electrode plate with a potential difference of 0kV and 5kV is added on both sides of the electrolytic cell for deposition. After the deposition, the iron-nickel thin film with good quality is obtained.

[0025] From the XRD collection of examples 1 and example 2 such as figure 2 The (110), (111) and (220) diffraction peaks of iron-cobalt can be clearly seen in the figure, and the obtained films are all iron-cobalt films. The AFM figure and SEM figure of embodiment 1 and example 2 are as image 3 and 4 As shown, when no electrode plate is added (or t...

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Abstract

The invention discloses a method for improving the electro-deposition thin film quality. The method for improving the electro-deposition thin film quality is characterized in that electro-deposition is carried out in a common manner; and when the electro-deposition is carried out, an additional electric field is arranged in the direction perpendicular to an electro-deposition electric field. By means of the method, the quality of a thin film prepared in an electro-deposition manner can be remarkably improved, prepared thin film particles are smaller, and the surface is very even.

Description

technical field [0001] The invention belongs to the technical field of electrodeposition, and specifically the invention relates to a method for improving the quality of an electrodeposition film. Background technique [0002] Electrodeposition is to pass a current in an aqueous solution containing metal ions to be plated, so that positively charged cations are discharged on the cathode, so that a metal, alloy, semiconductor or other conductor film is obtained. Electrodeposition has become an integral part of modern industry and is widely used in the preparation of metals, alloys, semiconductor chips and nanotechnology. At the same time, as high-tech industries such as the electronics industry are rapidly reaching maturity, their explosive growth requires the extensive use of electrochemical deposition in manufacturing. [0003] Commonly used thin film preparation methods (such as magnetron sputtering, molecular beam epitaxy, etc.) have produced good thin films, but they re...

Claims

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Application Information

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IPC IPC(8): C25D5/00
Inventor 刘青芳曹德让潘丽宁王建波
Owner LANZHOU UNIVERSITY