Press felt base fabric exhibiting reduced interference

A technology of base fabric and fabric belt, applied in the direction of fabric, textile, textile and paper making, etc., can solve the problems of uneven water removal and sheet marking, etc., to achieve improved pressure uniformity, long felt life, high porosity volume effect

Active Publication Date: 2015-12-02
ASTENJOHNSON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This architecture can also lead to interference patterns between the two layers, areas of relatively low and high yarn density due to yarn misalignment in the two opposing surfaces, and uneven moisture removal for the aforementioned reasons with sheet marked

Method used

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  • Press felt base fabric exhibiting reduced interference
  • Press felt base fabric exhibiting reduced interference
  • Press felt base fabric exhibiting reduced interference

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0074] In the combination of conventional spiral wound press mats (hereinafter referred to as "multiaxial") or flat-woven press felts of double-layer construction (comprising one single layer of fabric suspended inside another layer) (hereinafter referred to as "flat-woven") A base fabric such as 100 in FIG. 1 is woven from a single monofilament fiber warp yarn 12 and a single monofilament fiber weft yarn 14 according to a flat weave as shown or other desired pattern as applicable for the intended end use. In multiaxial fabrics, the base fabric 100 is helically wound as a narrow strip to provide the length and width of the final fabric required to form a tubular sock-like structure, which is flattened on itself to form two stacked layers; , the two layers of base fabric 100 are respectively woven into required width and length, and then one of them is inserted into the other. In FIG. 1, distance X represents the regular yarn-to-yarn spacing of single monofilament fiber weft ya...

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Abstract

A press felt formed of two stacked layers of woven single layer base fabric, each layer being formed by warp yarns interwoven with two systems of weft yarns according to a single layer weave pattern. The layers are needled with a batt layer. In the woven single layer base fabric: a) the warp yarns are polymeric monofilaments arranged as a single layer and there are two systems of weft yarns; b) the first system of weft yarns are formed by cabled polymeric monofilaments and the second system of weft yarns are single polymeric monofilaments; c) the cabled polymeric monofilaments are 50% to 85% in one repeat; d) the cabled monofilaments are each formed of at least two monofilaments which are cabled together; and e) at least two of the cabled weft yarns in each repeat are adjacent to each other.

Description

technical field [0001] Related Application Cross Reference [0002] This application claims the benefit of 61 / 761,280 filed February 6, 2013, which is hereby incorporated by reference as if filed in its entirety. [0003] The technical field of the invention [0004] The present invention relates to single-ply woven technical textiles intended for use in a two-ply stacked arrangement of base fabrics as full width flat woven press felts or in helically wound multiaxial press felts. Particularly in relation to such textiles in which at least some of the weft yarns are bundled monofilament fiber arrangements, yarn interference patterns are minimized in structures where two such textiles overlap. Background technique Background of the invention [0005] In the manufacture of paper, board, and similar cellulosic products, a headbox directs a thin stock pulp consisting of about 99 percent water together with about 1 percent papermaking fibers and other ingredients to the formi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): D02G3/02D03D3/04D21F7/08
CPCD21F1/0027D21F7/08D03D15/283B32B5/06B32B5/26D03D13/004D03D13/008D10B2331/02D21F7/083
Inventor 汉江·许罗伯特·W·赫克丹尼尔·N·荷道
Owner ASTENJOHNSON
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