A sub-pixel structure and its manufacturing method, array substrate and display device
A manufacturing method and array substrate technology, applied in the fields of nonlinear optics, instrumentation, optics, etc., can solve the problems of increasing the driving voltage of the display panel and affecting the transmittance of the display panel, etc., so as to reduce the storage capacitance and overlap area , the effect of constant driving voltage and transmittance
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[0038] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0039] The sub-pixel structure provided by the embodiment of the present invention includes a "first electrode" and a "second electrode", and the "second electrode" is located on the "first electrode". In actual production applications, the "first electrode" can It is a pixel electrode, and the "second electrode" can be a common electrode, that is, the common electrode is located on the pixel electrode; the "first electrode" can also be a common electrode, and ...
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