Stripper composition for removing photoresist and method of stripping photoresist using the same
A technology of composition and release agent, applied in optics, opto-mechanical equipment, photosensitive material processing, etc., can solve problems such as reduced process economy and efficiency, environmental or process problems, etc.
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[0057] specific implementation plan
[0058] Hereinafter, the actions and effects of the present invention will be explained with reference to Examples and Comparative Examples. It should be noted that the examples are only for illustrating the present invention, and the scope of the present invention is not limited thereto.
[0059] Preparation of stripper composition for removing photoresist
[0060] According to the composition of Table 2 below, according to Examples 1 to 7 and Comparative Examples 1 to 3, the components were mixed to prepare a stripper composition for removing a photoresist.
[0061] [Table 2]
[0062]
[0063]
[0064] *LGA: imidazolyl-4-ethanol (IME)
[0065] *AEE: (2-aminoethoxy)-1-ethanol
[0066] *DMAC: Dimethylacetamide
[0067] *NMF: N-methylformamide
[0068] *DCA: N,N’-Diethylformamide
[0069] *DMF: N,N'-Dimethylformamide
[0070] *BDG: Diethylene glycol monobutyl ether
[0071] *MDG: Diethylene glycol monomethyl ether
[0072] *...
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