Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Earthworm and snail obstructer in airfield runway

An airport runway and barrier technology, which is used in applications, animal repellents, animal husbandry, etc., can solve the problem of inability to effectively prevent low-level animals such as earthworms and snails from climbing into the airstrip, so as to prolong the efficacy period and reduce pollution. , the effect of reducing the threat

Inactive Publication Date: 2016-01-13
HEBEI UNIVERSITY
View PDF6 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide an earthworm and snail blocker for airport runways, to solve the problem that the existing physical cleaning method and chemical spraying method cannot effectively block earthworms and snails and other lower animals from climbing into the airstrip

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Earthworm and snail obstructer in airfield runway
  • Earthworm and snail obstructer in airfield runway
  • Earthworm and snail obstructer in airfield runway

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] The earthworm and snail blocker for the airport runway in the present invention includes several blocking units arranged on both sides of the airport runway. Such as Figure 1~Figure 4 As shown, each barrier unit is surrounded by bottom plate 1, left side plate 2, right side plate 3, rear side plate 4 and top plate 5 to form a semi-closed hollow cavity with an opening facing away from the airport runway, that is, the barrier unit faces One side of the airport runway is a closed structure. The bottom plate 1, the left side plate 2 and the right side plate 3 are all flat plate structures; Both are perpendicular to the bottom plate 1. Rear side plate 4 and top plate 5 can be flat structure, as figure 1 Shown; Rear side plate 4 and top plate 5 also can be made into one and be curved, smooth arc panel, as figure 2 shown.

[0018] When the rear side plate 4 is a flat plate structure, it can be perpendicular to the bottom plate 1 (that is, the angle between the rear side...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides an earthworm and snail obstructer in an airfield runway. The earthworm and snail obstructer in the airfield runway comprises a plurality of obstructing units which are separately arranged on two sides of the airfield runway; each of the obstructing units is a semi-closed hollow cavity which is encircled by a bottom plate, a left side plate, a right side plate, a rear side plate and a top plate, wherein the opening of the cavity backs on to the airfield runway. A vertical plate which is vertical to the left side plate and is suspended in the bottom is mounted on the top plate in the hollow cavity, and the height of the vertical plate is not greater than half of the height of the left side plate and the length of the vertical plate is equivalent to that of the bottom plate; an agent holding plate is mounted on the side face, facing the rear side plate, of the vertical plate, and the length of the agent holding plate is equivalent to that of the vertical plate; a chemical agent for killing or repelling earthworms and snails is put on the agent holding plate. By using the earthworm and snail obstructer in the airfield runway, lower animals such as earthworms and snails can be effectively prevented from entering into the airfield runway in all weather. The obstructer not only can physically obstruct the earthworms and snails, but also can chemically kill the earthworms and snails, and the obstructer is simple in using method and lasting in effectiveness.

Description

technical field [0001] The invention relates to the field of ground handling and security of aircraft in the aviation industry, in particular to an earthworm and snail blocker for airport runways. Background technique [0002] At present, in order to prevent earthworms, snails and other low-level animals in the grassland of the airport from crawling into the airstrip, physical cleaning methods and chemical spraying methods are generally used for prevention and control, that is, earthworms, snails and other low-grade animals entering the runway are promptly removed by manpower. Wait for the animals to clear the runway, or directly spread the chemical drugs on the grass around the runway, and use the killing or repelling effect of the chemical drugs to achieve the purpose of prevention and control. However, the above methods have the following problems: the physical cleaning method is time-consuming and laborious, with strong randomness, incomplete treatment, and strong repeat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A01M29/34
Inventor 侯建华
Owner HEBEI UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com