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Stepless adjustable apparatus for adjusting probe position of epitaxial wafer temperature measurer

A technology of thermometer and epitaxial wafer, which is applied in the field of MOCVD epitaxial wafer pyrometer probe position adjustment, which can solve the problems of inaccurate measurement data and affecting the actual monitoring of MOCVD reaction chamber, etc.

Inactive Publication Date: 2016-02-24
ZHONGSHAN DEHUA CHIP TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] It is known in the industry that the installation position of the probe of the epitaxial wafer pyrometer of the existing MOCVD equipment is fixed. If the position and number of wafers placed on the tray change, due to the fixed position of the probe, the probe may not be able to measure The correct position on the epitaxial wafer leads to inaccurate measurement data, which affects the actual monitoring of the MOCVD reaction chamber

Method used

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  • Stepless adjustable apparatus for adjusting probe position of epitaxial wafer temperature measurer
  • Stepless adjustable apparatus for adjusting probe position of epitaxial wafer temperature measurer
  • Stepless adjustable apparatus for adjusting probe position of epitaxial wafer temperature measurer

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Embodiment Construction

[0016] The present invention will be further described below in conjunction with specific examples.

[0017] like Figure 1 to Figure 5 As shown, the stepless adjustable device for adjusting the probe position of the epitaxial wafer pyrometer described in this embodiment includes a flange cover for the detection port 1, a probe mounting seat 2, a probe adjustment frame 3, a probe adjustment screw 4, Screw mounting plate 5, wherein, the detection port flange cover 1 is installed on the top of the MOCVD reaction chamber 6 for growing epitaxial wafers, above the inner tray 7 of the MOCVD reaction chamber, and the detection port flange cover 1 has an observation window 8 with a long rectangular structure, so that the probe 9 of the thermometer can detect the wafer 10 on the tray 7 at different positions, and the probe mount 2 is slidably installed on the flange of the detection port Cover 1, and straddle the top of the observation window 8, can freely slide in the length directio...

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Abstract

The invention discloses a stepless adjustable apparatus for adjusting a probe position of an epitaxial wafer temperature measurer. The apparatus comprises a detection port flange cover, a probe installation seat, a probe adjusting rack, a probe adjusting screw rod, and a screw rod installation plate. The detection port flange cover is installed at the top of an MOCVD reaction chamber; and an observation window is formed in the detection port flange cover. The probe installation seat is installed on the detection port flange cover in a sliding mode and can slide freely at a length direction of the observation window. A temperature measurer probe is installed on the probe installation seat vertically; a through hole with internal threads is formed in the probe adjusting rack, wherein the intenral threads of the through hole match the probe adjusting screw rod. The probe adjusting rack and the probe installation seat are fixedly connected; and the screw rod installation plate is installed on the detection port flange cover vertically. One end of the probe adjusting screw rod passes through the screw rod installation plate horizontally and then extends into the through hole of the probe adjusting rack and, together with the probe adjusting rack, forms a nut lead screw mechanism. With the apparatus, precise stepless adjustment of the temperature measurer installation position can be realized effectively.

Description

technical field [0001] The invention relates to the technical field of adjusting the probe position of an MOCVD epitaxial wafer thermometer, in particular to a stepless adjustable device for adjusting the probe position of an epitaxial wafer thermometer. Background technique [0002] It is known in the industry that the installation position of the probe of the epitaxial wafer pyrometer of the existing MOCVD equipment is fixed. If the position and number of wafers placed on the tray change, due to the fixed position of the probe, the probe may not be able to measure The correct position on the epitaxial wafer leads to inaccurate measurement data, which affects the actual monitoring of the MOCVD reaction chamber. Contents of the invention [0003] The purpose of the present invention is to overcome the deficiencies and shortcomings of the prior art, and provide a stepless adjustable device for adjusting the probe position of the epitaxial wafer thermometer, which can effect...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01K1/14G01K1/08
Inventor 刘向平杨翠柏方聪张杨张露靳恺王雷
Owner ZHONGSHAN DEHUA CHIP TECH CO LTD
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