Solar cell containing P-type semiconductor electrode and fabrication method of solar cell

A technology of solar cells and semiconductors, applied in the field of solar cells, can solve the problems of reducing the area of ​​incident light, difficult to industrialize, complicated preparation process, etc., and achieve the effects of reducing reflection, reducing internal resistance, and simple preparation method

Inactive Publication Date: 2016-05-04
FOSHAN JUCHENG BIOCHEM TECH RES & DEV CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In the prior art, the light-receiving surface of general solar cells has a negative electrode, which will reduce the area where light can be incident, while the preparation process of general back-contact solar cells is complicated, and it is not easy to realize industrialization

Method used

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  • Solar cell containing P-type semiconductor electrode and fabrication method of solar cell

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preparation example Construction

[0033] The present invention also provides a method for preparing a solar cell, the method comprising: combining the negative electrode, the PN junction silicon chip, and the positive electrode sequentially from the light-receiving surface to the backlight surface to obtain a solar cell; the negative electrode includes a P-type solar cell on the light-receiving surface The semiconductor sheet and the silver electrode sheet on the backlight surface, the P-type semiconductor sheet and the silver electrode sheet are both connected to the light-receiving surface of the PN junction silicon sheet.

[0034] According to the present invention, in order to reduce the reflection of incident light and the internal resistance of solar energy, the light-receiving surface of the PN junction silicon wafer preferably also includes an anti-reflection film, and the anti-reflection film can be silicon nitride and / or titanium oxide anti-reflection film , the backlight surface of the PN junction si...

Embodiment 1

[0040] Such as figure 1 As shown, a 5 cm × 5 cm phosphorus-doped silicon wafer is subjected to boron diffusion to obtain a boron-diffused phosphorus-doped silicon wafer. The P pole of the boron-diffused phosphorus doped silicon wafer is coated with a silicon nitride anti-reflection film, and the N pole is coated with silver. back field.

[0041] Overlap the 2.5cm×2cm P-type semiconductor sheet and the 2.5cm×2cm silver electrode sheet, then place one end in the middle of the anti-reflection film and weld it, and the other end protrudes 0.5cm from the silicon chip, using a 0.1cm×0.2cm P-type semiconductor The small piece connects the P-type semiconductor piece with the anti-reflection film.

[0042] The copper sheet is spot-welded on the silver back field as the negative electrode to obtain the solar cell of the present invention.

Embodiment 2

[0044] Such as figure 1 As shown, a 5 cm × 5 cm phosphorus-doped silicon wafer is subjected to boron diffusion to obtain a boron-diffused phosphorus-doped silicon wafer. The P pole of the boron-diffused phosphorus doped silicon wafer is coated with a titanium oxide anti-reflection film, and the N pole is coated with a silver back. field.

[0045] Overlap the 2.5cm×2cm P-type semiconductor sheet and the 2.5cm×2cm silver electrode sheet, then place one end in the middle of the anti-reflection film and weld it, and the other end protrudes 0.5cm from the silicon chip, using a 0.1cm×0.2cm P-type semiconductor The small piece connects the P-type semiconductor piece with the anti-reflection film.

[0046] The copper sheet is spot-welded on the silver back field as the negative electrode to obtain the solar cell of the present invention.

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Abstract

The invention relates to a solar cell containing a P-type semiconductor electrode and a fabrication method of the solar cell. The solar cell sequentially comprises a negative electrode, a positive-negative (PN) junction silicon wafer and a positive electrode from a light incident surface to a backlight surface, wherein the negative electrode comprises a P-type semiconductor wafer on the light incident surface and a silver electrode plate on the backlight surface, and the P-type semiconductor wafer and the silver electrode plate are both connected with the light incident surface of the PN junction silicon wafer. The solar cell has the advantages that the light incident surface of the solar cell is large, and the fabrication method is simple.

Description

technical field [0001] The invention relates to the field of solar cells, in particular to a solar cell containing a P-type semiconductor electrode and a preparation method thereof. Background technique [0002] With the advent of the new century, the global economy is developing rapidly, human demand for energy continues to increase, and the extensive use of fossil fuels has led to a rapid shortage of energy and increasing environmental pollution. The world is facing a serious fact: energy The problem has become a hot spot and a difficult point in economic development. At present, the shortage of traditional energy sources and environmental pollution have become the main problems restricting economic development, and it is becoming more and more urgent to find non-polluting energy sources. Solar energy is a kind of energy produced by hydrogen nuclear fusion reaction, and the energy is quite huge. The energy irradiated on the earth every second can be equivalent to the heat...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): H01L31/0216H01L31/0224H01L31/18
CPCH01L31/02168H01L31/022441H01L31/1804Y02E10/547Y02P70/50
Inventor不公告发明人
OwnerFOSHAN JUCHENG BIOCHEM TECH RES & DEV CO LTD