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Lithography equipment

A technology for lithography equipment and balancing masses, which is applied in the field of integrated circuit equipment manufacturing, can solve the problems of high cost, increase the difficulty of realizing and controlling the workpiece table and mask table, and achieve the effect of reducing the difficulty of control

Active Publication Date: 2017-12-29
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The implementation of this method significantly increases the difficulty of realization and control of the workpiece table and mask table, and the cost is relatively high

Method used

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  • Lithography equipment
  • Lithography equipment
  • Lithography equipment

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Embodiment Construction

[0023] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0024] The present invention relates to a lithography equipment, comprising a base platform, a work table located on the base platform, a mask table, a drive device for the work table, a drive device for the mask table and a balance mass, wherein the balance mass includes a first A balance mass, a second balance mass, and a balance mass connector connecting the first balance mass and the second balance mass, the first balance mass and the second balance mass are respectively connected The workpiece table driving device and the mask table driving device, the balance mass connection part makes the first balance mass block and the second balance mass block move in reverse synchronously so as to realize scanning in the lithography equipment During the exposure process, the workpiece table and the mask table move synchronously and reversely.

[00...

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Abstract

The invention discloses a lithography equipment, which is characterized in that it includes: a basic platform, and a workpiece table, a mask table, a workpiece table driving device, a mask table driving device and a balance mass located on the basic platform, the The balance mass is respectively connected to the workpiece table driving device and the mask table driving device to realize the synchronous reverse movement of the workpiece table and the mask table during the scanning exposure process of the lithography equipment.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to photolithography equipment. Background technique [0002] In the VLSI optical lithography, the main factor determining the thinnest line width of the micro pattern is the lithography work resolution of the lithography equipment, and the synchronous scanning movement of the reticle and the substrate is one of the key factors affecting the lithography resolution one. With the improvement of the integration level of large-scale integrated circuit devices, the working resolution of the lithography machine is required to be higher and higher. To ensure the resolution of the lithography, it is necessary to improve the plate stage (mask stage) and the substrate stage (substrate stage / Workpiece table) synchronous motion accuracy and scanning speed. In order to improve the resolution of the lithography machine, on the one hand, it is possible to reduce the sync...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 徐伟单世宝
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD