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Photoetching equipment

A technology of lithography equipment and balancing mass block, which is applied in the field of integrated circuit equipment manufacturing, can solve the problems of high cost, increase the difficulty of realization and control of a workpiece stage and a mask stage, and achieve the effect of reducing the difficulty of control.

Active Publication Date: 2016-06-01
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The implementation of this method significantly increases the difficulty of realization and control of the workpiece table and mask table, and the cost is relatively high

Method used

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Embodiment Construction

[0024] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0025] The present invention relates to a lithography equipment, comprising a basic platform, and a workpiece table, a mask table, a workpiece table drive device, a mask table drive device and a balance mass located on the base platform, and the balance mass is respectively connected to the The workpiece table driving device and the mask table driving device are used to realize the synchronous reverse movement of the workpiece table and the mask table during the scanning exposure process of the lithography equipment.

[0026] Optionally, the balance mass includes a first balance mass and a second balance mass, the first balance mass is connected to the motor stator of the workpiece table driving device, and the second balance mass is connected to the The motor stator of the mask table driving device is connected, and when the motor mover of th...

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Abstract

The invention discloses photoetching equipment, characterized by comprising a foundation platform, a wafer stage, a reticle stage, a wafer stage driving device, a reticle stage driving device and a balance mass, wherein the wafer stage, the reticle stage, the wafer stage driving device, the reticle stage driving device and the balance mass are placed on the foundation platform; the balance mass is respectively connected with the wafer stage platform driving device and the reticle stage driving device, so as to realize synchronous reverse motion of the wafer stage driving device and the wafer stage driving device in the scanning exposure process of the photoetching equipment.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to photolithography equipment. Background technique [0002] In the VLSI optical lithography, the main factor determining the thinnest line width of the micro pattern is the lithography work resolution of the lithography equipment, and the synchronous scanning movement of the reticle and the substrate is one of the key factors affecting the lithography resolution one. With the improvement of the integration of large-scale integrated circuit devices, the working resolution of lithography machines is getting higher and higher. To ensure the resolution of lithography, it is necessary to improve the plate stage (mask stage) and the plate stage (substrate stage / workpiece table) synchronous motion accuracy and scanning speed. In order to improve the resolution of the lithography machine, on the one hand, it is possible to reduce the synchronization error of the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 徐伟单世宝
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD