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Methods and apparatus for sensing a substrate in a chamber

A technology for sensing bases and devices, used in scattering characteristics measurement, semiconductor/solid-state device testing/measurement, electrical components, etc.

Active Publication Date: 2016-07-06
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Reliable optical detection of substrates in electronics processing chambers using conventional optical sensors can be difficult due to the different reflectivities of the substrates

Method used

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  • Methods and apparatus for sensing a substrate in a chamber
  • Methods and apparatus for sensing a substrate in a chamber
  • Methods and apparatus for sensing a substrate in a chamber

Examples

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Embodiment Construction

[0028] For the purposes of interpreting this specification, whenever appropriate, terms used in the singular will also include the plural and vice versa. The use of "or" is intended to mean "and / or" unless stated otherwise. In this document, the use of "a" is intended to mean "one or more" unless stated otherwise or the use of "one or more" is manifestly inappropriate. The use of "comprise, comprises, comprising", "include, includes, including", "has, having" are interchangeable and are not meant to be limiting. In addition, when the description of one or more embodiments uses the term "comprising", those of ordinary skill in the art will understand that in some specific instances, the language "consisting essentially of" and / or "comprising" can be used The embodiment will be described instead.

[0029] Although the teachings herein are described in connection with various implementations, the teachings herein are not meant to be limited to those implementations. On the con...

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PUM

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Abstract

The present invention provides methods, apparatus, and systems of sensing a substrate in a chamber. The invention includes emitting radiation of at least two different wavelengths; directing the emitted radiation of a first wavelength through a view port of a chamber at an interior of the chamber; directing the emitted radiation of a second wavelength through the view port of the chamber at a location of a hole in a blade of a substrate carrier; detecting any of the emitted radiation reflected by the blade, the interior of the chamber, or a substrate on the blade; and determining if a substrate is present on the blade based on the reflected radiation detected. Numerous additional aspects are disclosed.

Description

[0001] This application is a divisional application of an invention patent application with an application date of August 10, 2012, an application number of 201280039886.X, and an invention title of "Method and Device for Sensing a Substrate in a Chamber". [0002] related application [0003] This application claims priority to U.S. Provisional Patent Application Serial No. 61 / 524,090, filed August 16, 2011, entitled "METHODSANDAPPARATUSFORSENSINGASUBSTRATEINACHAMBER" (For Sensing Substrates in a Chamber Method and Apparatus of Published Edition) (Attorney No. 16270 / L), which application is hereby incorporated by reference in its entirety for all purposes. technical field [0004] The present invention relates to methods and apparatus for sensing a substrate within a chamber. More particularly, the present invention relates to methods and apparatus for sensing different substrates, where each substrate may have a different reflectivity. Background technique [0005] Due t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/66H01L21/67
CPCH01L21/67242H01L21/67259H01L22/12G01N21/55H01L22/24H01L22/30
Inventor 罗纳德·维恩·肖尔
Owner APPLIED MATERIALS INC