Method for controlling heat treatment forming diversity of silicon-based microstructures

Abstract

The invention discloses a method for controlling heat treatment forming diversity of silicon-based microstructures. The method comprises the following steps: step one, increasing alpha=Ds / D value, performing heat treatment on a sample in the same temperature environment, to obtain a first silicon-based microstructure; step two, increasing alpha=Ds / D value, performing heat treatment on the sample for the same time in step one and at the same temperature in step one, to obtain a second silicon-based microstructure; step three, increasing alpha=Ds / D value, performing heat treatment on the sample for the same time in step two and at the same temperature in step two, to obtain a third silicon-based microstructure; step four, increasing tan(theta)=(D+Ds) / H value, performing heat treatment on the sample for the same time in step one and at the same temperature in step one, to obtain a fourth silicon-based microstructure; step five, increasing tan(theta)=(D+Ds) / H value, performing heat treatment on the sample for the same time in step one and at the same temperature in step one, to obtain a fifth silicon-based microstructure; step six, increasing tan(theta)=(D+Ds) / H value, performing heat treatment on the sample for the same time in step one and at the same temperature in step one, to obtain a sixth silicon-based microstructure; step seven, increasing the alpha value and the tan(theta) value, performing heat treatment on the sample for the same time in step one and at the same temperature in step one, taking four initial state values, to respectively obtain the sixth silicon-based microstructure, seventh silicon-based microstructure, eighth silicon-based microstructure and ninth silicon-based microstructure; using tan(theta)=(D+Ds) / H as the X-coordinate and using alpha=Ds / D as the Y-coordinate, to obtain change states of the silicon-based microstructures.

Description

technical field [0001] The invention belongs to the technical field of micro-nano manufacturing, and in particular relates to a method for controlling the diversity of silicon-based microstructures by heat treatment and forming. Background technique [0002] MEMS (Micro-Electro-Mechanical System) is also called micro-electro-mechanical system, micro-system, micro-machine, etc. Wide application can effectively improve the automation and intelligence of the system. [0003] Silicon material is one of the main materials for MEMS manufacturing. A three-dimensional structure with a size of micron is produced on a silicon chip to realize the perception and control of external information, which can constitute a multifunctional micro system. In recent years, various disciplines have been persistently trying various new scientific and technological methods to design and manufacture silicon-based microstructure Silicon on nothing (SON) and apply it to various mechanical devices, suc...

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Problems solved by technology

However, these results are still unable to reveal the law of the diversity of processing morphology, so there is no guiding significance for the optimization of the processing process.

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