Jig for electrochemical deposition as well as electrochemical deposition apparatus and electrochemical deposition method
An electrochemical and fixture technology, applied in the field of electrochemical deposition, can solve the problems of difficulty in judging the immersion depth, the accuracy of the deposition process cannot be guaranteed, and the immersion depth of the reference electrode cannot be observed, so as to achieve the effect of enhancing flexibility and ensuring accuracy.
Active Publication Date: 2018-06-15
神华(北京)光伏科技研发有限公司
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Problems solved by technology
When preparing large-area samples, the water bath device is usually made of stainless steel, so the immersion depth of the reference electrode cannot be observed from the side.
Difficulty judging immersion depth from above as steam from the water bath blocks view
The uncertainty of the position of the reference electrode makes the accuracy of the deposition process impossible to guarantee
Method used
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[0061] use figure 2 For the jig shown, the growth substrate clamped in the jig is placed horizontally in the electrolyte for electrochemical deposition. The conditions of electrochemical deposition are: the potential is -1.41V, the time is 1800s, and the temperature is 76°C to obtain zinc oxide Nanostructured Materials A1. Photos of the material as Image 6 As shown, its photoluminescence spectrum is shown as Figure 7 As shown, its optical quality uniformity test chart is shown in Figure 8 shown.
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Abstract
The invention relates to a clamp used for electrochemical deposition, an electrochemical deposition apparatus and an electrochemical deposition method thereof. The clamp comprises a clamping plate (1) used for clamping a growth substrate, a flat (2) used for bearing a counter electrode, a support member (3) and a pedestal (4) used for arranging a reference electrode; the clamping plate (1) and the pedestal (4) are fixed together through a pillar (5), the flat (2) is arranged between the clamping plate and the pedestal in an adjustable mode along a first direction (y) through the pillar (5), the clamp, the flat and the pedestal are mutually parallel, and the support member is arranged between the clamping plate and the flat. The electrochemical deposition apparatus comprises an electrolytic bath (6), the above clamp and an electrochemical work station (7), and the electrolytic bath is used for placing the clamp. The uniformity of the materials prepared by the electrochemical deposition apparatus can be greatly increased.
Description
technical field [0001] The invention belongs to the field of electrochemical deposition, and in particular relates to a fixture for electrochemical deposition, an electrochemical deposition device and an electrochemical deposition method. Background technique [0002] Electrochemical deposition is one of the important methods to prepare metal and metal oxide nanostructure arrays. The electrodeposition system device includes fixtures, constant temperature water bath device, electrochemical workstation, connecting wires, and other auxiliary devices. Electrodeposition materials are prepared in the form of three electrodes or two electrodes in experiments and production. [0003] In the process of large-area electrodeposition, there are two technical problems that need to be solved urgently in the traditional electrodeposition device system. On the one hand, the upper end of the traditional fixture is exposed to the air (such as figure 1 As shown), the lower electrode (workin...
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IPC IPC(8): C25D17/06
Inventor 汤洋郭逦达白安琪陈颉
Owner 神华(北京)光伏科技研发有限公司