Unlock instant, AI-driven research and patent intelligence for your innovation.

Imprint apparatus and method of manufacturing article

A manufacturing method and technology of articles, applied in the direction of photoplate-making process, optics, optomechanical equipment, etc. on the pattern surface, capable of solving unresolved problems such as embossing devices

Active Publication Date: 2016-08-24
CANON KK
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The technology disclosed in Japanese Patent Application Laid-Open No. 2011-49405 has the advantage of restoring the semiconductor exposure device, but it does not solve the above-mentioned problems specific to the imprint device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Imprint apparatus and method of manufacturing article
  • Imprint apparatus and method of manufacturing article
  • Imprint apparatus and method of manufacturing article

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0015] Preferred embodiments of the present invention will be described below with reference to the accompanying drawings. Note that the same reference numerals denote the same components for all the drawings, so repeated description will not be given.

[0016] figure 1 is a schematic diagram showing the configuration of the imprint apparatus 1 according to one aspect of the present invention. The imprint apparatus 1 is a photolithography apparatus used to manufacture devices such as semiconductor devices as articles. The imprint apparatus 1 performs an imprint process of forming a pattern on an imprint material on a substrate by using a mold. The imprint apparatus 1 transfers a pattern formed on a mold to a substrate by curing the imprint material on the substrate while the imprint material is in contact with the mold, and releasing the cured imprint material from the mold. This embodiment uses a resin as an imprint material, and employs a photocuring method of curing the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention provides an imprint apparatus which performs an imprint process of forming a pattern on an imprint material on a substrate by using a mold, the apparatus including a detection unit configured to detect an occurrence of an error while the imprint process is performed, and a control unit configured to perform error processing of ceasing the imprint process and unloading the substrate from the imprint apparatus upon curing the imprint material on the substrate when the detection unit detects the occurrence of the error before the imprint material on the substrate is cured.

Description

technical field [0001] The present invention relates to an embossing device and a method for manufacturing an article. Background technique [0002] As the demand for miniaturization of semiconductor devices is increasing, imprint apparatuses that pattern an imprint material (resin) on a substrate by using a mold have attracted attention in addition to conventional photolithography. This imprint apparatus is capable of forming fine patterns (structures) on the order of several nanometers on a substrate. [0003] As one method of curing an imprint material in an imprint apparatus, there is available a photocuring method in which an imprint material is cured by irradiating with light such as ultraviolet rays. An imprint apparatus using a photocuring method cures the imprint material on a shot region (imprint region) of a substrate by irradiating the imprint material with light while the imprint material is in contact with the mold, and removes the mold from the The cured imp...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00B82Y40/00
CPCB82Y40/00G03F7/0002B29C43/021B29C2043/5833B29C2043/5891B29K2105/246B29C43/58B29C2043/585B29L2031/3406
Inventor 竹村瞬
Owner CANON KK