A kind of dual channel rc-igbt device and preparation method thereof
A dual-channel, device technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve problems such as the path of increasing current, current concentration and uneven temperature, and affect the reliability of RC-IGBT devices. Effects of improving reliability and solving problems of current and temperature uniformity
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Embodiment 1
[0036] This embodiment provides a dual-channel RC-IGBT with a voltage level of 600V, and its cell structure is as follows figure 2 As shown, it includes emitter structure, gate structure, collector structure and drift region structure. The emitter structure includes metal emitter 1, P+ ohmic contact region 2, N+ emitter region 3 and P-type base region 4, where P+ The ohmic contact region 2 and the N+ emitter region 3 are independently arranged in the P-type base region 4, and the surfaces of the P+ ohmic contact region 2 and the N+ emitter region 3 are in contact with the metal emitter 1; the drift region structure includes N- The drift region 7 and the N-type electric field stop layer 8, the N-type electric field stop layer 8 is arranged on the back of the N-drift region 7; the gate structure includes a gate electrode 6 and a gate oxide layer 5, and the gate electrode 6 and N+ A gate oxide layer 5 is arranged between the emitter region 3, the P-type base region 4 and the N-d...
Embodiment 2
[0039] This embodiment provides a dual-channel RC-IGBT with a voltage level of 600V, and its cell structure is as follows image 3 As shown, this structure is based on Embodiment 1, and an N-type collector bypass region 12 is also provided between the N-type electric field stop layer 8 and the ohmic contact metal 13, and the N-type collector The front side of the bypass region 12 is in contact with the back side of the N-type electric field stop layer 8 , and the back side of the N-type collector bypass region 12 is connected to the ohmic contact metal 13 to form an ohmic contact. The thickness of the N-type collector bypass region 12 is also 0.1-0.3 microns smaller than the thickness of the P-type collector region 9, but compared with the N-type collector region 11, its thickness and doping concentration can be the same or different .
[0040] The preparation method of above-mentioned dual-channel RC-IGBT, such as Image 6 As shown, it specifically includes the following st...
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