The invention provides a reverse conducting
insulated gate bipolar transistor and a preparation method thereof, and belongs to the technical field of power
semiconductor devices, the reverse conducting
insulated gate bipolar transistor is characterized in that a first trench is a gate trench, a second trench is an emitter trench, and a third trench is an invalid gate trench; the first groove, the second groove and the third groove are sequentially arranged at intervals in the transverse direction parallel to the surface of the
cell, the first groove and the second groove are connected through a fourth groove, and the fourth groove is a grid
electrode groove; in the longitudinal direction, the second grooves are located between every two adjacent fourth grooves. The beneficial effects of the invention are that the gate trench is connected with the invalid gate trench through the transverse gate trench, thereby reducing the forward conduction
voltage drop and
conduction loss of the device; current channels are increased, so that
current distribution is more uniform, heat loss is reduced, and reliability and
power density of the device are improved; the polysilicon gates and the
metal gates are repeatedly arranged at intervals in the transverse direction and the longitudinal direction of the emitter trench to form the diodes and the Schottky diodes which are regularly arranged, so that the
current distribution of the backward diodes is more uniform.