Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Radio frequency (RF) laterally diffused metal oxide semiconductor (LDMOS) component and manufacture method

A manufacturing method and device technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of snapback effect, device voltage failure, large base resistance, etc., to reduce the base resistance, The effect of improving transconductance and reducing hot carrier effect

Active Publication Date: 2013-04-10
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
View PDF5 Cites 24 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The metal can reduce the resistance of the substrate and improve the thermal diffusion ability, but the device with this structure still has the base resistance R B Larger, there may be a snapback effect, causing the tube to burn and other device voltage resistance failures to occur

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Radio frequency (RF) laterally diffused metal oxide semiconductor (LDMOS) component and manufacture method
  • Radio frequency (RF) laterally diffused metal oxide semiconductor (LDMOS) component and manufacture method
  • Radio frequency (RF) laterally diffused metal oxide semiconductor (LDMOS) component and manufacture method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] The structure of RFLDMOS device described in the present invention is as Figure 14 Shown:

[0038] On the P-type silicon substrate 311 , there is a lightly doped P-type epitaxy 312 .

[0039] In the lightly doped P-type epitaxy 312 , there is an N-type lightly doped drain drift region 317 and a P-type channel region 316 abutting against it.

[0040] The N-type lightly doped drain drift region 317 includes the drain region 321 of the RFLDMOS device, and the surface of the drain region 321 has a metal silicide 319 leading to the drain of the RFLDMOS device.

[0041] The P-type channel region 316 includes a heavily doped P-type channel connection region 322 and a heavily doped N-type region 320 abutting against it. The heavily doped N-type region 320 is the RFLDMOS device. source area.

[0042] The surface of the heavily doped P-type channel connection region 322 and the source region 320 of the RFLDMOS is covered with a layer of metal silicide 319 leading to the sourc...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a radio frequency (RF) laterally diffused metal oxide semiconductor (LDMOS) component. A light dope P type buried layer and a middle dope buried layer in the light dope P type buried layer are additionally arranged under a P type channel region. The base electrode resistance of a parasitic non-protein nitrogen (NPN) pipe can be reduced, so that snapback effect is not prone to be generated. A reversed diode formed by a source electrode, the channel and the buried layer can strangulate drain-source voltage of an LDMOS and can sink extra current on a substrate. Thick gate oxide at the drain electrode end can reduce hot carrier effect, and thin gate oxide at the source electrode end can improve transconductance of the component. The invention further discloses a manufacture method of the RF LDMOS component. In process realization, the manufacture method only adds two photoetching steps in an existing process so as to be easy to implement.

Description

technical field [0001] The invention relates to the field of semiconductor integrated circuits, in particular to an RFLDMOS applied to high-power radio frequency signal amplification. The present invention also relates to a manufacturing method of said RFLDMOS device. Background technique [0002] RFLDMOS (Radio Frequency Laterally Diffused Metal Oxide Semiconductor) is a semiconductor with high gain, high linearity, high withstand voltage, and high output power, which is widely used in radio and television transmitting base stations, mobile transmitting base stations, radars, etc. RF power devices have two operating voltages of 28V and 50V, and the corresponding breakdown voltage requirements are 70V and 120V respectively. The basic structure of the device is as figure 1 As shown, it is an N-type device, and the higher withstand voltage is determined by the length of the N-type low-doped drift region 6 (the distance from the heavily doped N-type drain terminal 7 to the ed...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/78H01L29/10H01L29/08H01L21/336
CPCH01L29/402H01L29/42368H01L29/423H01L29/66659H01L29/7835H01L29/1083H01L29/66681H01L29/7823
Inventor 周正良遇寒蔡莹陈曦
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com