The invention provides an SOI-RC-LIGBT device and a preparation method thereof. The SOI-RC-LIGBT device comprises an N-type substrate, a buried oxide layer, an N-type drift region, a trench gate structure, a P-type base region, an N+ source region, a P+ contact region, an emitting electrode, an oxide layer, an N-type buffer region and a P-type collector region; an N-type strip is arranged on the surface of the portion, between the P-type base region and the N-type buffer region, of the N-type drift region, and a P-type buried layer is arranged in the portion, below the N-type strip, of the drift region; a medium trench structure is arranged between the right sides of the N-type strip and the P-type buried layer and the left sides of the N-type buffer region and the P-type collector region;an N+ collector region is arranged between the N-type strip and the medium trench structure. According to the SOI-RC-LIGBT device, while the IGBT conduction characteristic snapback phenomena are eliminated, the breakdown voltage of the device is improved, the forward conduction voltage drop of the device is reduced, the shutoff speed is increased, the shutoff loss is reduced, and meanwhile, the reverse recovery characteristics of an integrated free-wheeling diode are improved.