The invention is a method for avoiding or reducing V-type defect of blue-green light emitting diode material which has in turn sapphire substrate, low-temperature grown GaN buffer layer, high-temperature grown n-GaN layer, InGa1-Yn/GaN multi-quantum trap layer, and p-Alx Ga1-xN/ p-GaN layer, characterized in that: there is a grown n-AlxGa1-xN/GaN superlattice layer between the high-temperature grown n-GaN layer and InGa1-Yn/GaN multi-quantum trap layer, where 0<x<1, the growth temperature is between 1100deg.C and 1200deg.C, the pressure is 30Torr-100Torr, the AlxGa1-xN layer is 1nm-5nm thick, the GaN layer is 1nm-5nm thick, the periodicity is 5-10, the doping concentration is between 1*1016cm-3 and 1*1018cm-3; there is also a weak n-type doped GaN layer between the high-temperature grown n-GaN layer and InGa1-Yn/GaN multi-quantum trap layer, where the growth temperature is 1150 deg.C-1200 deg.C, the growth pressure is 30Torr-80Torr, and the thickness is 1m-50nm, the doping concentration is between 1*1016cm-3 and 5*1017cm-3. And it can avoid or reduce V-type defect and reverse leakage current generated by this.