Integrated trench mosfet and junction barrier schottky rectifier with trench contact structures
Patent Information
- Authority / Receiving Office
- US · United States
- Patent Type
- Applications(United States)
- Current Assignee / Owner
- FORCE MOS TECH CO LTD
- Publication Date
- 2009-12-24
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Abstract
Description
BACKGROUND OF THE INVENTION
[0001] 1. Field of the Invention
[0002] This invention relates generally to the cell structure, device configuration and fabrication process of power semiconductor devices. More particularly, this invention relates to an improved cell configuration and processes to manufacture trench MOSFET device with junction barrier Schottky rectifier in the same cell so that integrated cells with spacing savings and lower capacitance and higher performance are achieved.
[0003] 2. The Prior Arts
[0004] Normally for high efficiency DC / DC application, a Schottky rectifier is externally added in parallel with a MOSFET device. FIG. 1 is a circuit diagram that illustrates the implementation of a Schottky diode with a power MOSFET device. Once the parasitic P / N diode is turned on, both the electron and hole carriers are generated thus require longer time to eliminate the carriers by electron-hole combination. In order to achieve higher speed and efficiency, the Schottky diode (SKY) ...