Thyristor controlled by accumulation layer

A technology of thyristor and accumulation layer, applied in the direction of thyristor, electrical components, circuits, etc., can solve the problems of current density limitation, reduction of forward voltage drop, increase of forward voltage drop, etc., to achieve low forward voltage drop, Large saturation current density, the effect of a wide range of applications

A technology of thyristor and accumulation layer, applied in the direction of thyristor, electrical components, circuits, etc., can solve the problems of current density limitation, reduction of forward voltage drop, increase of forward voltage drop, etc., to achieve low forward voltage drop, Large saturation current density, the effect of a wide range of applications

CN101478002AInactive Publication Date: 2009-07-08UNIV OF ELECTRONICS SCI & TECH OF CHINA

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  • Thyristor controlled by accumulation layer
  • Thyristor controlled by accumulation layer
  • Thyristor controlled by accumulation layer

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Embodiment Construction

[0043] By adopting the accumulation layer control structure of the present invention, low conduction voltage drop, high current density, and large safe working area can be obtained, better current saturation characteristics and thyristor turn-off capability can be achieved, and it can be applied to epitaxial process and thin film process manufacturing technology . With the development of semiconductor technology, more power devices with low voltage drop, high current and high reliability can be produced by adopting the invention.

[0044] An accumulation layer controlled thyristor, such as Image 6 As shown, including metallized anode 1, anode P area 2, N - Base 3, P + Bypass region 4, metallized cathode 5, gate oxide layer 6, polysilicon gate 7, P-type base region 8, N + Source region 9, N - depletion region 33 and N + Layer 200; N - A trench insulating gate is sandwiched between the base region 3 and the metallized cathode 5, and the trench insulating gate is composed ...

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Abstract

An accumulation layer controlled thyristor, which belongs to the technical field of semiconductor power devices, is characterized in that the on / off of the thyristor can be controlled by stopping electron circulation through an electron barrier of an internal electric field formed in a P bypass region and an N depletion region. When a positive voltage is applied on a gate, an accumulation layer is formed at the interface between the N depletion region (33) and a gate oxide layer (6); an electron inversion channel is formed in a P-type base region (8); and electrons pass through an N active region (9), the accumulation layer, an N layer (200), and the electron inversion channel to the an N base region (3), thereby controlling the normal operation of the device. The accumulation layer controlled thyristor as the substitute of the conventional gate controlled thyristors, such as MOS controlled thyristors, has the advantages of lower conduction voltage drop, larger saturation current density, no parasitic effect, and greatly improved safety operation area, and can overcome the disadvantages of the conventional gate-controlled thyristors, such as the deficiency of current saturation characteristic and poor turn-off capability.

Description

technical field [0001] A thyristor controlled by an accumulation layer belongs to the technical field of semiconductor power devices. Background technique [0002] In recent years, the insulated gate bipolar transistor (Insulated Gate Bipolar Transistor, or IGBT) has been widely used due to the combination of simple driving circuit of MOSFET, high switching speed and high current density and low saturation voltage of bipolar power transistor. Wider and wider. However, the forward conduction voltage drop of the IGBT will become very large when the high voltage is applied, which is mainly due to the N - The base region is very thick, lightly doped N on the side close to the emitter - The base region cannot be effectively modulated in conductance. In the gate-controlled thyristor device, the anode has hole injection, and the cathode has electron injection, which can realize the N - The conductance modulation of the base area is sufficient, the forward voltage drop and on-st...

Claims

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Application Information

Patent Timeline
08 Jul 2009
Publication
CN101478002A
IPC
H01L29/74
CPC
H01L29/7455
Inventors
李泽宏; 钱梦亮