The invention relates to a gate commutated
thyristor having a dual-p-base-region gate
cathode structure and a preparation method thereof, and belongs to the technical field of
semiconductor integrated circuits. The gate commutated
thyristor comprises more than one
chip cell. Each
chip cell is composed of a p+ emitter
electrode, an n' buffer region, an n- buffer region, a p base region 1, a p base region 2, a p+ short base region, an n+ emitter
electrode, an
anode metal electrode, a gate
metal electrode and a
cathode metal electrode. The p+ emitter electrode, the n' buffer region, the n- buffer region, the p base region 1, the p base region 2, the p+ short base region and the n+ emitter electrode are arranged in turn. According to the technical scheme of the invention, the gate metal electrode and the
cathode metal electrode are ensured to be in the same plane with the surface of a
silicon chip based on the conventional trenching process or the channeling abandonment process on the surface of the n+ emitter electrode and the gate electrode. The gate commutated
thyristor is provided with an extra layer of p base region, so that the reverse
breakdown voltage of a J3 junction is ensured to be larger. Furthermore, the
voltage of an external reverse power supply is increased, so that the commutation speed is improved. The turn-off ability of GCT chips is improved.