IGBT device with a groove gate type JFET structure
A grooved gate and gate structure technology, which is applied in the fields of semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of reducing the turn-off capability of the device, increasing the turn-off loss of the device, and damaging the breakdown voltage of the device. , to reduce the saturated turn-on voltage drop and turn-off loss, reduce the gate resistance, and improve the turn-off capability.
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[0029] An IGBT device with a groove gate JFET structure, such as figure 2As shown, its cellular structure includes a metal collector 7, a first conductivity type semiconductor collector region 6, a second conductivity type semiconductor buffer layer 5, a second conductivity type semiconductor drift region 4, and a metal emitter stacked sequentially from bottom to top. pole 11; the top layer of the second conductivity type semiconductor drift region 4 has a first conductivity type semiconductor body region 8, a first conductivity type semiconductor base region 2, a second conductivity type semiconductor emitter region 1 and a first gate structure; The first conductivity type semiconductor body region 8 is located in the middle region of the top layer of the second conductivity type semiconductor drift region 4; the first conductivity type semiconductor base region 2 is respectively located in the regions on both sides of the second conductivity type semiconductor drift region 4...
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