IGBT device with a groove gate type JFET structure
A grooved gate and gate structure technology, which is applied in the fields of semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of reducing the turn-off capability of the device, increasing the turn-off loss of the device, and damaging the breakdown voltage of the device. , to reduce the saturated turn-on voltage drop and turn-off loss, reduce the gate resistance, and improve the turn-off capability.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2018-11-06
Smart Images

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Abstract
Description
technical field
[0001] The invention belongs to the technical field of power semiconductor devices, and in particular relates to an IGBT device with a groove gate JFET structure. Background technique
[0002] With the rapid development of rail transit, smart grid, green energy and other fields, insulated gate bipolar transistor (Insulated Gate Bipolar Transistor, IGBT) has simple gate control, high input impedance, fast switching speed, high current density, saturation voltage It has become one of the mainstream power switching devices in the field of medium and high power power electronics; at the same time, it will continue to develop in the direction of high voltage, high current, high operating temperature and high reliability. The application of IGBT devices in high-voltage applications, especially in the process of motor driving, will experience a short circuit at both ends of the device; the device will be turned on when the load is short-circuited, resulting in a sho...
Examples
Embodiment
[0029] An IGBT device with a groove gate JFET structure, such as figure 2As shown, its cellular structure includes a metal collector 7, a first conductivity type semiconductor collector region 6, a second conductivity type semiconductor buffer layer 5, a second conductivity type semiconductor drift region 4, and a metal emitter stacked sequentially from bottom to top. pole 11; the top layer of the second conductivity type semiconductor drift region 4 has a first conductivity type semiconductor body region 8, a first conductivity type semiconductor base region 2, a second conductivity type semiconductor emitter region 1 and a first gate structure; The first conductivity type semiconductor body region 8 is located in the middle region of the top layer of the second conductivity type semiconductor drift region 4; the first conductivity type semiconductor base region 2 is respectively located in the regions on both sides of the second conductivity type semiconductor drift region 4...