IGBT apparatus provided with internal JFET structure
A device and gate structure technology, applied in the field of power semiconductor devices, can solve the problems of increased device turn-off loss, low discharge efficiency, affecting gate control capability, etc. Withstand voltage and working reliability, the effect of avoiding short-circuit failure phenomenon
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[0031] An IGBT device with a built-in JFET structure such as figure 2As shown, its cellular structure includes a metal collector 7, a first conductivity type semiconductor collector region 6, a second conductivity type semiconductor buffer layer 5, a second conductivity type semiconductor drift region 4, and a metal emitter stacked sequentially from bottom to top. Pole 11; the top layer of the second conductivity type semiconductor drift region 4 has a first conductivity type semiconductor body region 8, a first conductivity type semiconductor base region 2, a second conductivity type semiconductor emitter region 1 and a gate structure; the second conductivity type semiconductor A semiconductor body region 8 of a conductivity type is located in the middle region of the top layer of the semiconductor drift region 4 of the second conductivity type; the semiconductor base region 2 of the first conductivity type is respectively located in regions on both sides of the top layer of ...
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