Reverse-conducting double-insulated-gate bipolar transistor

A bipolar transistor, gate insulation technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of unfavorable LIGBT device practical application, excessive device current density, current rebound, etc., and reduce the forward conduction voltage. The effect of reducing, improving current capability, and reducing turn-off loss

Active Publication Date: 2014-07-16
SOUTHEAST UNIV
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

But it also has a very serious current rebound phenomenon
When multiple LIGBT devices are connected in parallel, if there is a phenomenon of current bounce in the device, it will cause the current density of a single device to be too high and burn out, which is not conducive to the practical application of LIGBT devices

Method used

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Embodiment Construction

[0027] Combine below figure 2 , the present invention is described in detail, a reverse conduction type double gate insulated gate bipolar transistor, including: a reverse conduction type double gate insulated gate bipolar transistor, including: a P-type substrate 1 and a field oxide layer 19, A buried oxygen 2 is arranged on the P-type substrate 1, and a drift region is arranged on the buried oxygen 2. It is characterized in that the drift region includes a first N-type drift region 3, a first P-type drift region 4, and a second drift region. N-type drift region 17 and second P-type drift region 18, the first N-type drift region 3 and the first P-type drift region 4 are arranged diagonally, the second N-type drift region 17 and the second P-type drift region Zone 18 set diagonally,

[0028] A P-type body region 5 is arranged in the first N-type drift region 3 and the second P-type drift region 18 , and a heavily doped N-type emitter region 6 and a heavily doped P-type body ...

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Abstract

The invention provides a semiconductor capable of improving the current rebounding phenomenon of a reverse-conducting double-insulated-gate bipolar transistor, improving the turn-off speed and improving voltage resistance. The semiconductor is structurally characterized in that a buried oxide is arranged on a P-type substrate and provided with a drift region, the drift region comprises a first N-type drift region, a first P-type drift region, a second N-type drift region and a second P-type drift region, the first N-type drift region and the first P-type drift region are arranged in an opposite-angle mode, and the second N-type drift region and the second P-type drift region are arranged in an opposite-angle mode; a P-type region is arranged in the first N-type drift region and the second P-type drift region, an N-type emitter region, a P-type collector region and cathode metal connecting the N-type emitter region with the P-type collector region are arranged in the P-type region, and a cathode gate oxide and a cathode polycrystalline silicon layer are arranged on the upper surface of the P-type region; an N-type region is arranged in the first P-type drift region and the second N-type drift region, an N-type collector region, a P-type emitter region and anode metal connecting the N-type collector region with the P-type emitter region are arranged in the N-type region, and an anode gate oxide and an anode polycrystalline silicon layer are arranged on the upper surface of the N-type region.

Description

technical field [0001] The invention mainly relates to the technical field of power semiconductor devices, in particular to a reverse-conducting double-gate insulated gate bipolar transistor, which is especially suitable for high-power integrated circuits such as variable frequency speed regulation, electric traction, variable frequency household appliances, and half-bridge drive circuits and automobile production. Background technique [0002] Insulated gate bipolar transistor IGBT is a composite power device evolved from the combination of MOS gate device structure and bipolar transistor structure. It also has the characteristics of MOS tube and bipolar transistor, and has good on-state current and switching. [0003] trade-off between losses. Silicon-on-Insulator Lateral Insulated Gate Bipolar Transistor (SOI-Lateral Insulated Gate Bipolar Transistor, SOI-LIGBT) is a typical SOI-based device with easy integration, high withstand voltage, strong drive current capability, ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/739H01L29/06H01L29/423
CPCH01L29/0619H01L29/423H01L29/7393
Inventor 孙伟锋杜益成杨卓祝靖徐申陆生礼时龙兴
Owner SOUTHEAST UNIV
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