A method for photolithography process optimization
An optimization method and technology of lithography process, applied in the direction of photoplate-making process of pattern surface, optics, and originals for photomechanical processing, etc., can solve the problems of expensive software and limited predictive ability, and achieve shortened processing time, cost reduction effect
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[0026] In order to make the content of the present invention clearer and easier to understand, the content of the present invention will be further described below in conjunction with the accompanying drawings. Of course, the present invention is not limited to this specific embodiment, and general replacements known to those skilled in the art are also covered within the protection scope of the present invention.
[0027] The following is attached Figure 1-4 The present invention will be described in further detail with specific examples. It should be noted that the drawings are all in a very simplified form, using imprecise scales, and are only used to facilitate and clearly achieve the purpose of assisting in describing the present embodiment.
[0028] see figure 1 , the photolithography process optimization method of this embodiment, including:
[0029] Step 01: Select feature data;
[0030] Specifically, the feature data includes: the size, shape and distance between...
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