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Cleaning method after magnetorheological polishing of kdp crystal

A technology of magnetorheological polishing and crystals, which is applied in the directions of cleaning methods, cleaning methods and utensils using liquids, chemical instruments and methods, etc., and can solve the problems of low ion beam cleaning efficiency and obvious scratches.

Active Publication Date: 2021-04-30
INST OF MACHINERY MFG TECH CHINA ACAD OF ENG PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The existing KDP crystal cleaning methods all have certain defects: scrubbing will cause obvious scratches, ion beam cleaning is inefficient, etc.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] Cleaning method of the present invention comprises the following steps:

[0020] (1) After the KDP crystal magnetorheological polishing is completed, the jet cleaning technology is used to wash the surface of the workpiece evenly with ethanol as the cleaning agent.

[0021] (2) Start the ultrasonic wave and work for 30 minutes to exhaust the air in the water and reduce the energy attenuation.

[0022] (3) Start the heating device and control the temperature at 85°C.

[0023] (4) Put the workpiece into a combined cleaning agent containing amine and alcohol compounds, take it out after 15 minutes of composite ultrasonic frequency cleaning, and quickly pour off the cleaning agent. This is the rough cleaning process.

[0024] (5) Put the workpiece into the combined cleaning agent containing amine and alcohol compounds again, take it out after 15 minutes of composite ultrasonic frequency cleaning, and quickly pour off the cleaning agent. This is the fine cleaning process. ...

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PUM

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Abstract

The invention provides a cleaning method for KDP crystal after magnetorheological polishing, which comprises the following steps: (1) performing jet cleaning on the polished KDP crystal; (2) performing composite ultrasonic frequency combined solvent on the KDP crystal after jet cleaning Cleaning; (3) In step (2), the combined cleaning agent includes amine and alcohol cleaning agents; (4) In step (2), the composite frequency covers 45-1500KHz. (5) After cleaning, dry the KDP crystals and store them in a sealed moisture-proof box. The invention is easy to operate, can efficiently remove various pollutions such as oil film and particles produced by magnetorheological polishing of KDP crystals, can obtain lower roughness after cleaning, and provides good technical support for ultra-precision polishing of laser frequency doubling crystals.

Description

technical field [0001] The invention relates to a cleaning method for optical elements after polishing, in particular to a cleaning method for KDP crystal magnetorheological polishing. Background technique [0002] The continuous improvement of the performance of ICF lasers also puts forward further requirements on the damage threshold of the applied crystal, and the damage threshold of the crystal also directly determines the energy density of the laser output and its own service life. KDP (KH 2 PO 4 ) crystal is an optical material used for electro-optic switch and laser frequency doubling and triple frequency in inertial confinement fusion (ICF) high-power lasers. The crystal has the characteristics of soft, deliquescent, easy to crack, sensitive to temperature changes and high brittleness. , it is very easy to produce defective layers, residual stress and subsurface damage during processing. However, the currently widely used diamond single-point flying cutting techno...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B3/02B08B3/12B08B3/08
CPCB08B3/02B08B3/08B08B3/12
Inventor 王超王宝瑞吉方黄文何建国李晓媛汤光平张云飞魏齐龙罗清郑永成朱元庆
Owner INST OF MACHINERY MFG TECH CHINA ACAD OF ENG PHYSICS