Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sewing stitch generation method and sewing stitch generation device

A technology of sewing needles and stitches, applied in the field of sewing, can solve the problem of low uniformity of spacing, achieve uniform distribution, improve technology, and meet the effects of industrial needs

Active Publication Date: 2017-01-04
BEIJING DAHAO TECH
View PDF5 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention provides a method and device for generating sewing stitches, which are used to avoid the defects of low uniformity of spacing between stitch points in sewing stitches in the prior art as much as possible

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sewing stitch generation method and sewing stitch generation device
  • Sewing stitch generation method and sewing stitch generation device
  • Sewing stitch generation method and sewing stitch generation device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] The execution subject of this embodiment is a sewing stitch generation device. figure 1 It is a schematic flow chart of a sewing stitch generation method according to Embodiment 1 of the present invention, as figure 1 As shown, the sewing stitch generation method of the present embodiment includes:

[0026] Step 101: Obtain the contour line corresponding to the sewing stitch, the contour line is represented by a third-order Bezier curve parameter equation, and go to step 102.

[0027] Specifically, for the contour line to be sewed, it is expressed by a third-order Bezier curve parameter equation, that is, the contour line B(t) using the third-order Bezier curve equation can be expressed as:

[0028] B(t)=P0*(1-t) 3 +3*P1*t*(1-t) 2 +3*P2*t 2 *(1-t)+P3*t 3 ,t∈(0,1]

[0029] Specifically, drawing software can be used to input the data representing the contour line, so as to obtain the values ​​of the parameters P0, P1, P2 and P3 of the third-order Bezier curve equati...

Embodiment 2

[0047] This embodiment provides a sewing stitch generation method based on the first embodiment. figure 2 It is a schematic flow chart of a sewing stitch generation method according to Embodiment 2 of the present invention, as figure 2 As shown, the sewing stitch generation method of the present embodiment includes:

[0048] Step 101: Obtain the contour line corresponding to the sewing stitch, the contour line is represented by a third-order Bezier curve parameter equation, and go to step 102.

[0049] Step 102: Obtain the density parameter, expected stitch length and temporary stitch length, and go to step 103.

[0050] Step 103: According to the density parameter and the contour line, generate an interpolation point list according to the starting order of the contour line, the interpolation point list includes the positions of each interpolation point on the contour line, the first point in the interpolation point list is the initial point, The last point in the interpol...

Embodiment 3

[0081] The present invention also provides a device for generating sewing stitches, which is used to implement the method for generating sewing stitches in Embodiment 1. image 3 It is a structural schematic diagram of a sewing stitch generating device according to Embodiment 3 of the present invention. Such as image 3 As shown, the sewing stitch generation device includes: a contour line acquisition module 301, a temporary stitch distance acquisition module 302, an interpolation point generation module 303, an actual stitch point number acquisition module 304, an actual stitch point position acquisition module 305 and a sewing module 306.

[0082] The contour acquisition module 301 is used to obtain the contour corresponding to the sewing stitch, and the contour is represented by a third-order Bezier curve parameter equation;

[0083] The temporary stitch distance acquisition module 302 is used to obtain density parameters, expected stitch lengths and temporary stitch leng...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a sewing stitch generation method and a sewing stitch generation device. The sewing stitch generation method comprises the following steps of: acquiring an outline line corresponding to a sewing stitch, and expressing the outline line by use of a three-order Bezier curve parameter equation; acquiring a density parameter, an expected needle pitch and a temporary needle pitch; generating an interpolation point list in an initiation sequence of the outline line according to the density parameter and the outline line; acquiring the number of actual stitch points according to the length of the outline line and the temporary needle pitch; acquiring the position of each actual stitch point according to the interpolation point list and the number of the actual stitch points; and triggering a sewing device to perform sewing according to the position of each actual stitch point. The sewing stitch generation method and the sewing stitch generation device provided by the invention have the advantages that by virtue of the treatment processes, the position of each actual stitch point can be acquired, and then the sewing device is triggered to perform sewing according to the position of each actual stitch point, so that actual stitch points generated on the curve can be uniformly distributed, the process is improved, and further industrial demands are met.

Description

technical field [0001] The invention relates to sewing technology, in particular to a sewing stitch generation method and device. Background technique [0002] The sewing industry has certain requirements for the uniformity of sewing stitches. Generally, the error is required to be controlled within the range of 0.2 mm, and the requirements for the uniformity of sewing stitches on high-end clothing are even higher. From a geometric point of view, the uniform point on the straight line is very easy to obtain, and can be obtained through simple linear operations, while the geometric performance of the curve is very complicated due to its mathematical characteristics, and the uniform interpolation point on the curve is relatively difficult to obtain. [0003] At present, the uniformity of stitch points generated by the method of interpolating curves used in the industry is not ideal, and the uniformity of the spacing between stitch points in sewing stitches is not high, which l...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): D05B69/00
Inventor 蔡建强邢少鹏胡文海侯文学
Owner BEIJING DAHAO TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com