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Alignment structure, display device and method for measuring alignment accuracy using the alignment structure

A technology of alignment accuracy and film layer, which is applied in semiconductor/solid-state device testing/measurement, semiconductor/solid-state device parts, instruments, etc. Layer alignment accuracy and other issues, to achieve the effect of measuring alignment accuracy

Active Publication Date: 2019-05-21
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, when the thickness of the barrier film layer 30 between the alignment reference film layer 20 and the film layer 40 to be aligned is thicker, the machine platform 50 cannot grasp the alignment reference film layer 20 and the film layer 40 to be aligned. Edge, resulting in measurement failure and unable to monitor the alignment accuracy of the film layer
In addition, when the light transmittance of the alignment reference film layer 20 is low, the machine 50 cannot grasp the edge of the alignment film layer 40 due to the low light intensity, which will also lead to measurement failure and failure to monitor the film layer. Alignment accuracy

Method used

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  • Alignment structure, display device and method for measuring alignment accuracy using the alignment structure
  • Alignment structure, display device and method for measuring alignment accuracy using the alignment structure
  • Alignment structure, display device and method for measuring alignment accuracy using the alignment structure

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Embodiment Construction

[0024] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the specific embodiments set forth herein. Rather, the embodiments are provided to explain the principles of the invention and its practical application, thereby enabling others skilled in the art to understand the invention for various embodiments and with various modifications as are suited to particular intended uses.

[0025] In the drawings, the thicknesses of layers and regions are exaggerated for device clarity. Like reference numerals refer to like elements throughout the drawings.

[0026] figure 2 is a block diagram of a display device according to an embodiment of the present invention.

[0027] refer to figure 2 , The display device according to the embodiment of the present invention includes: a display area 300 , a non-displ...

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Abstract

The invention discloses an overlay structure for measuring the overlay precision between films of a TFT. The overlay structure comprises an overlay reference film on a glass substrate, a barrier film and a film to be overlain. The barrier film is provided with a through hole; the overlay reference film and the film to be overlain are arranged in the through hole; and the film to be overlain is arranged on the overlay reference film. Since hole-digging processing is carried out on the barrier film, a machine can directly capture edges of the overlay reference film and the film to be overlain, so that monitoring of the overlay precision of the films is finished; and besides, by enabling projection of the film to be overlain in a plane, where the overlay reference film locates, to be totally arranged in the overlay reference film, light can be overlain to the reference film, and the machine is allowed to capture the edges of the film to be overlain in the overlay reference film, and thus the purpose of measuring the overlay precision is achieved.

Description

technical field [0001] The invention belongs to the technical field of manufacturing thin-film transistors (TFTs), in particular, relates to an alignment structure for measuring the alignment accuracy between various film layers of a TFT, a display device, and various devices for measuring TFTs using the alignment structure. Method of alignment accuracy between layers. Background technique [0002] At present, thin film transistor liquid crystal display (TFT-LCD) is developing towards high pixel density (PPI), and a major obstacle restricting the development of TFT-LCD to high PPI is the alignment accuracy (Overlay) between the layers of TFT. At present, the production process of TFT is to coat a film on a glass substrate and use a photolithography process (ie Photo process) to form a film layer with a specific pattern, and the alignment accuracy between different film layers directly affects the electrical performance of the TFT, so the current In the industry, an overlay ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/66H01L23/544H01L29/786G02F1/1368
Inventor 赵瑜卢改平
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD