Dual-workpiece table device for immersed photoetching machine and immersed photoetching machine
A technology of double workpiece table and lithography machine, which is applied in the direction of microlithography exposure equipment, photolithography exposure device, etc., can solve the problems of immersion liquid leakage, hindering position measurement, strip mirror shadowing, etc., to achieve the elimination of gaps, The effect of preventing leakage
Active Publication Date: 2018-01-09
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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[0004] However, since the existing double-workpiece exchange bridge is arranged on the side of the micro-motion module of the workpiece table, if it is applied to a micro-motion module with a long mirror, it will inevitably cause the shadow of the long mirror and hinder the position. measurement, and there may be leakage of immersion liquid when the positions of the two workpiece tables are exchanged, which makes the design and implementation of immersion liquid maintenance more difficult
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[0036] In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. However, the present invention can be implemented in many other ways different from those described here, and those skilled in the art can make similar extensions without violating the connotation of the present invention, so the present invention is not limited by the specific embodiments disclosed below.
[0037] In the following, specific embodiments of the present invention will be described in conjunction with the accompanying drawings. see figure 1 As shown in -8, the present invention provides a double work table device for an immersion lithography machine.
[0038] See figure 1 and Figure 4 , figure 1 and Figure 4 A front view and a top view of a double worktable device for an immersion lithography machine are respectively shown when the switching mechanism is in an initial position according to an embodiment of t...
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The invention relates to a dual-workpiece table device for an immersed photoetching machine and the immersed photoetching machine. The dual-workpiece table device comprises two workpiece tables and anexchange mechanism, wherein each workpiece table comprises a rough moving module, a collision-prevention device and a slight moving module, the collision-prevention device is fixed on the rough moving module, the exchange mechanism is arranged on the collision-prevention device(s) of one or two workpiece table(s) and comprises an exchange bridge plate and a lifting mechanism, the lifting mechanism can be used for transferring the exchange bridge plate to a working position so that the exchange bridge plate is arranged between the slight moving modules of the two workpiece tables during exchange of the two workpiece tables, and a top surface of the lifting mechanism and top surfaces of the slight moving modules of the two workpiece tables are basically arranged in the same plane. By the dual-workpiece table device, elongate lenses on the slight moving modules of the workpiece tables are prevented from being shaded by the exchange mechanism, and the maintaining of an immersed liquid field during exchange of the two tables is improved.
Description
technical field [0001] The invention relates to the field of microelectronic equipment, in particular to a double worktable device for an immersion photolithography machine and the immersion photolithography machine. Background technique [0002] The use of the immersion double-workpiece lithography machine makes it possible to "dry measurement, immersion exposure": that is, the "dry" measurement of the silicon wafer is completed at the measurement position. After obtaining the precise three-dimensional shape of the silicon wafer, the duplex The unique focus detection algorithm of the lithography machine can obtain the defocus amount of the silicon wafer in advance, and then position the silicon wafer to the ideal focal plane to complete the immersion exposure without performing leveling and focusing measurement at the exposure position, realizing duplex The seamless connection between piece stage technology and immersion exposure technology. [0003] The immersion lithogra...
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IPC IPC(8): G03F7/20
Inventor 丛国栋郑清泉方洁
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD