Frictional diffusion welding method for aluminum target assembly

Abstract

The invention discloses a frictional diffusion welding method for an aluminum target assembly. The frictional diffusion welding method for the aluminum target assembly comprises the following steps that firstly, to-be-welded faces of an aluminum target and an aluminum back plate are mechanically polished and cleaned; secondly, the aluminum target and the aluminum back plate which are treated in the first step are fixed through a clamp so that the to-be-welded faces of the aluminum target and the aluminum back plate can be arranged oppositely, the to-be-welded faces of the aluminum target and the aluminum back plate are made to draw close to each other through a driving clamp, at least one of the aluminum target and the aluminum back plate is rotated in the process of drawing close to eachother, and after the aluminum back plate and the aluminum target are in contact, the pressure is increased to 0.5 MPa-2.0 MPa and is maintained for 5 s-25 s to complete primary frictional welding; thirdly, the aluminum target assembly subjected to primary frictional welding in the second step is placed in an axial pressurizing diffusion welding furnace, vacuumizing is conducted, and heating and pressurization in the axial direction are conducted till welding is completed; and fourthly, the aluminum target assembly treated in the third step is cooled. By adoption of the frictional diffusion method for the aluminum target assembly, the problems that when an aluminum target assembly is subjected to diffusion welding directly, the requirement for the environment condition is high, and defectsof weld joints are likely to be caused are solved.

Description

technical field [0001] The invention relates to the field of manufacturing vacuum sputtering targets, in particular to a method for friction diffusion welding of aluminum target components. Background technique [0002] The sputtering target assembly consists of a target and a back plate, where the back plate plays the role of support and heat conduction. During the sputtering process, the ambient temperature of the target assembly is as high as 300°C to 600°C. One side of the target assembly is forced to be water-cooled, while the other side is kept at 10 -9 In the high vacuum environment of Pa, a huge temperature difference is formed on both sides; in addition, the target components are bombarded by various particles in the high-voltage electric field and magnetic field. Under this condition, if the welding strength between the target and the back plate is low, it is easy to cause deformation and cracking of the target, resulting in uneven sputtering. In severe cases, the...

AI Technical Summary

Problems solved by technology

When using the existing diffusion welding method to weld the aluminum target and the aluminum back plate, because the oxide film is not easy to remove, it is difficult to form a good atomic scale bond, and when the surface oxidation is serious, it is even impossible to achieve welding

Generally, it needs to be carried out under high vacuum, high temperature and high pressure, and the obtained target components have low welding strength and large deformation, which cannot meet the needs of long-term stable production and use of aluminum target components.

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