Method and apparatus of moving focus ring for plasma etcher

Abstract

A semiconductor manufacturing method and a semiconductor manufacturing tool for performing the same are disclosed. The semiconductor manufacturing tool includes a plasma chamber, a mounting platform disposed within the plasma chamber, a focus ring disposed within the plasma chamber, and at least one actuator mechanically coupled to the focus ring and configured to move the focus ring vertically. The actuator is configured to move the focus ring vertically when a plasma is present in the plasma chamber. The provided semiconductor manufacturing method can be used to dynamically control the etching speed of etching process.

Description

technical field [0001] Embodiments of the present invention relate to a semiconductor manufacturing method and device, in particular to a method and device for moving a focus ring in a plasma etching process. Background technique [0002] Semiconductor components are used in various electronic applications, such as personal computers, mobile phones, digital cameras and other electronic equipment. The manufacture of semiconductor devices usually involves depositing insulating or dielectric layers, conductive layers, and semiconductor layer materials on a semiconductor substrate in sequence, and patterning each material layer through lithography and etching processes to form circuit components and units thereon. [0003] The semiconductor industry continues to improve the integration density of electronic components (such as transistors, diodes, resistors and capacitors, etc.) by continuously reducing the minimum feature size to integrate more components into a given area. . ...

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However, with the reduction of the minimum wire diameter, additiona

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