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An Iris Diaphragm Based on Biaxial Guidance

A shaft-oriented and variable technology, applied in optics, optical components, instruments, etc., can solve the problems of difficulty in ensuring motion and positioning accuracy, and no decoupling function, so as to achieve the effect of decoupling orthogonal motion

Active Publication Date: 2019-05-31
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in this invention, the adjacent blades only have a linkage relationship, and do not have the decoupling function in the direction of orthogonal motion; and the structure of the double-bearing pre-tightening tool holder is used as the guide for linear motion, and its motion and positioning accuracy will be difficult to guarantee.
[0009] What the above inventions have in common is that none of them can realize window scanning in any range in the plane through the independent movement of the four coplanar light barriers; however, the stepper projection exposure device, as a key component in a cutting-edge photolithography machine, has become a constraint Key Technical Difficulties in Practical Application of Lithography Machine Exposure System

Method used

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  • An Iris Diaphragm Based on Biaxial Guidance
  • An Iris Diaphragm Based on Biaxial Guidance
  • An Iris Diaphragm Based on Biaxial Guidance

Examples

Experimental program
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Embodiment Construction

[0024] Embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0025] refer to figure 1 , an iris diaphragm based on biaxial guidance, including 4 independently controlled diaphragm movement mechanisms 1, each diaphragm movement mechanism 1 includes a diaphragm 3, and 4 diaphragms 3 end up with each other connected to form a rectangular iris diaphragm 2;

[0026] refer to figure 2 The diaphragm moving mechanism 1 includes a diaphragm 3, an active guide rail 4, a drive control unit 5, a triangular frame 7, a preload unit 8, and a driven guide rail 9, wherein the diaphragm 3 is processed with a weight-reducing groove 6 , the end of the driven guide rail 9 is processed with an anti-collision limiter 19; the active guide rail 4 is movably fitted on the drive control unit 5, the diaphragm plate 3 is installed on the active guide rail 4, and the triangular frame 7 is fixed on the The driven guide rail 9 is installed...

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Abstract

The invention discloses a variable diaphragm based on biaxial guidance. The device includes four independently controlled diaphragm plate movement mechanisms, and each diaphragm plate movement mechanism includes a driving guide rail, a driven guide rail, a corresponding drive control unit, and a pretension unit. Through the parallel installation of the active and driven guide rails, the movement support and guidance of the diaphragm plate are formed. The posture adjustment and positioning of the driven guide rail are realized through the magnetic preload and bearing preload, and the counterclockwise misplaced diaphragm is realized. Orthogonal movement of the film is decoupled; four diaphragm film movement mechanisms are connected end to end, and the rectangular diaphragm formed can realize window scanning in any range in the plane, and improve the accuracy and efficiency of window scanning. The invention can be used to build a scanning exposure device with high resolution and high motion / positioning accuracy.

Description

technical field [0001] The invention belongs to the technical field of precision instruments and machinery, and in particular relates to a variable diaphragm based on biaxial guidance. Background technique [0002] In recent years, as the advanced chip manufacturing industry gradually develops towards functional integration and volume miniaturization, after lithography technology has experienced several development stages of contact, proximity, and scanning projection, step-scan projection has become the current mainstream technology. [0003] As the light blocking device in the step-and-scan exposure system, the scanning slit is used to limit the size and center position of the illumination field of view of the mask surface, and to avoid the imaging beam from affecting the area outside the exposure field through the synchronous scanning movement of the blade during the exposure process. exposure. The main problem of the traditional scanning slit is that it cannot satisfy ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B26/02
CPCG02B26/02
Inventor 吴剑威温众普谭久彬
Owner HARBIN INST OF TECH