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A semi-decoupled linked iris diaphragm

A linkage type, diaphragm technology, applied in optics, optical components, opto-mechanical equipment, etc., can solve the problems of lack of decoupling function, difficult to guarantee motion and positioning accuracy, etc., to improve motion and positioning accuracy, speed and accuracy. The effect of efficiency

Active Publication Date: 2019-05-07
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in this invention, the adjacent blades only have a linkage relationship, and do not have the decoupling function in the direction of orthogonal motion; and the structure of the double-bearing pre-tightening tool holder is used as the guide for linear motion, and its motion and positioning accuracy will be difficult to guarantee.
[0009] What the above inventions have in common is that none of them can realize window scanning in any range in the plane through the independent movement of the four coplanar light barriers; however, the stepper projection exposure device, as a key component in a cutting-edge photolithography machine, has become a constraint Key Technical Difficulties in Practical Application of Lithography Machine Exposure System

Method used

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  • A semi-decoupled linked iris diaphragm
  • A semi-decoupled linked iris diaphragm
  • A semi-decoupled linked iris diaphragm

Examples

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Embodiment Construction

[0028] Embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0029] refer to figure 1 , 2 , 3. The left end aperture mechanism 1001 includes a linkage module 101, a driven guide rail 102, an aperture plate 103, a double-layer air bearing module 104, a reference main guide rail 105 and a drive module 106. The linkage module 101 includes a T-shaped bracket 1, a triangular Rail frame 2, magnet 3, ceramic bearing 4, adapter plate 5, sliding unit 6 and positioning shaft 7; in the left end aperture mechanism 1001, the reference main rail 105 and the driving module 106 are fixedly connected on the back plate 1005, double The layer air flotation module 104 is connected with the driving module 106, the main rail 105 and the driven rail 102 are installed inside the double-layer air flotation module 104, the end of the driven rail 102 is connected to the diaphragm plate 103, and the counterclockwise direction of the diaph...

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Abstract

The invention discloses a semi-decoupling linkage variable diaphragm. The device includes 4 active air bearing guide rails and 4 driven guide rails, which are connected by double-layer air bearing modules and linkage modules. The end of the driven guide rails is equipped with an aperture plate, and the four aperture plates are installed end-to-end in a rotationally symmetrical manner to form a Coplanar rectangular windows. The device can respectively control the counterclockwise dislocation of the four aperture plates through the driving module, realize scanning in any range in the plane, and improve the precision and efficiency of window scanning. The present invention can be used to build a high resolution, high motion / positioning precision projection exposure device.

Description

technical field [0001] The invention belongs to the technical field of precision instruments and machinery, in particular to a semi-decoupled linkage variable aperture. Background technique [0002] In recent years, as the advanced chip manufacturing industry gradually develops towards functional integration and volume miniaturization, after lithography technology has experienced several development stages of contact, proximity, and scanning projection, step-scan projection has become the current mainstream technology. [0003] As the light blocking device in the step-and-scan exposure system, the scanning slit is used to limit the size and center position of the illumination field of view of the mask surface, and to avoid the imaging beam from affecting the area outside the exposure field through the synchronous scanning movement of the blade during the exposure process. exposure. The main problem of the traditional scanning slit is that it cannot satisfy the two problems...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B7/00G02B26/10G03F7/20
CPCG02B7/00G02B26/10G03F7/70358
Inventor 吴剑威温众普崔继文谭久彬
Owner HARBIN INST OF TECH