Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Symmetrical parallel mechanism with three rotational degrees of freedom

A three-rotation, degree-of-freedom technology, used in manipulators, program-controlled manipulators, manufacturing tools, etc., can solve problems such as large rotation space, and achieve the effects of fast space speed, simple structure and high rigidity

Active Publication Date: 2018-11-06
SHANGHAI UNIV
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above applications all require the structure of the three-rotation parallel mechanism to have symmetry, fast speed and large rotation space

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Symmetrical parallel mechanism with three rotational degrees of freedom
  • Symmetrical parallel mechanism with three rotational degrees of freedom

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0011] The technical solutions of the present invention will be described in detail below in conjunction with the accompanying drawings, but the protection scope of the present invention is not limited to the embodiments.

[0012] like figure 1 As shown, a symmetrical parallel mechanism with three rotational degrees of freedom consists of a static platform 101, a dynamic platform 102, and a first active branch chain 103, a second active branch chain 104, and a third active branch chain 105 connecting the two platforms. Composition, the three active branch chains are symmetrically distributed in a space of 120 degrees.

[0013] like figure 2 As shown, the structure of the first active branch chain 103, the second active branch chain 104 and the third active branch chain 105 is the same, and each active branch chain is a parallelogram linkage slider mechanism, which consists of three connecting rod, two sliding rods and two sliding blocks; wherein, the first connecting rod 20...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a symmetrical parallel mechanism with three rotational degrees of freedom. The symmetrical parallel mechanism is composed of a static platform, a dynamic platform, a first active branching chain, a second active branching chain and a third active branching chain, wherein the first active branching chain, the second active branching chain and the third active branching chain are used for connecting the static platform and the dynamic platform, and the three active branching chains are distributed symmetrically in the space by 120 degrees. Each active branching chain isa parallelogram connecting rod sliding block mechanism which is composed of three connecting rods, two sliding rods and two sliding blocks and separately connected with the static platform and the dynamic platform through two rotating pairs. According to the symmetrical parallel mechanism with the three rotational degrees of freedom, the active branching chains are of the same mechanical structure, the kinematics and dynamics properties have symmetry, the internal rotation center points of the active branching chains overlap with one another, the movement ability is limited by one another, thethree-dimensional rotation with high spatial speed and large rotation range can be realized, and the symmetrical parallel mechanism with the three rotational degrees of freedom is suitable for satellite tracking and positioning, robot shoulder / wrist joint posture adjustment and other occasions.

Description

technical field [0001] The invention relates to the fields of mechanics and robotics, in particular to a symmetrical parallel mechanism with three rotational degrees of freedom. Background technique [0002] The parallel mechanism is a closed-loop motion system composed of multiple parallel branch chains, that is, one end of multiple parallel branch chains is connected to an end effector (moving platform) at the same time. Compared with the traditional serial mechanism, the parallel mechanism has greater rigidity, load and higher precision. In a sense, the parallel mechanism has the advantages of high rigidity, high precision, and high speed of CNC machine tools and the advantages of low cost, flexibility, and easy integration of industrial robots. Among them, the parallel mechanism with three rotational degrees of freedom has broad application prospects in the industrial field, and can be used for positioning and tracking devices for inter-satellite link satellites, roboti...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B25J9/00
CPCB25J9/00B25J9/003
Inventor 杨毅陈伟罗均李小毛彭艳
Owner SHANGHAI UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com