A method of using a process device for preparing electronic grade hydrogen fluoride
A process device, hydrogen fluoride technology, applied in the direction of hydrogen fluoride, fluorine/hydrogen fluoride, chemical instruments and methods, etc., can solve problems such as safety accidents, fluorine gas is highly toxic, and increase the difficulty and cost of processing
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Publication Date
- 2020-01-10
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Abstract
Description
Technical field
[0001] The invention relates to the technical field of fluorine chemicals, in particular to a method of using a process device for preparing electronic grade hydrogen fluoride. Background technique
[0002] Electronic grade hydrogen fluoride is mainly used as a cleaning agent and etchant in photovoltaics, integrated circuits and other industries. It is one of the key auxiliary materials for these industries. Because the impurity arsenic has a serious impact on the performance of electronic devices, the removal of arsenic is the purification of hydrogen fluoride The key technology, the usual method is to use an oxidant to oxidize trivalent arsenic into a high-boiling pentavalent arsenic compound, and then use the difference in volatility to distill it out. Chinese invention patent (patent number CN201110276860.4, patent name is a method for preparing electronic grade hydrofluoric acid) discloses a method for preparing electronic grade hydrofluoric acid, including t...
Examples
Embodiment Construction
[0033] The present invention will be further described below in conjunction with the drawings and specific embodiments.
[0034] Such as figure 1 , figure 2 , image 3 , Figure 4 , Figure 5 As shown, a method for preparing electronic grade hydrogen fluoride process equipment is characterized by:
[0035] Step one, inject anhydrous hydrogen fluoride into the circulation storage tank 3 of the transpiration circulation reactor I, observe through the sight glass, and ensure that the liquid level is 3~5cm lower than the plane of the gas-liquid separator 2 in the oxidation reactor 1 1 Inlet fluorine gas, keep the air pressure in the oxidation reactor 1 in balance with the ambient air pressure, observe the liquid level condition of the U-shaped liquid seal assembly at the bottom of the circulating fluidized bed distillation column with a liquid level gauge. The liquid level is at least 300mm higher than the return pipe to ensure that the U-shaped liquid seal assembly is in normal work...