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Detection system and detection method for high-flux combined material chips

A combined material chip and detection system technology, applied in the field of X-ray diffraction, can solve the problems of large focal spot of X-ray beam, incapable of automatic and rapid characterization, single sample stage structure, etc., and achieve effective detection effect

Active Publication Date: 2019-02-12
SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

Due to the large focal spot of the X-ray beam and the single structure of the sample stage, the existing X-ray diffraction equipment cannot perform effective, automatic and rapid characterization of its structure

Method used

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  • Detection system and detection method for high-flux combined material chips
  • Detection system and detection method for high-flux combined material chips
  • Detection system and detection method for high-flux combined material chips

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Embodiment Construction

[0052] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the specific embodiments set forth herein. Rather, the embodiments are provided to explain the principles of the invention and its practical application, thereby enabling others skilled in the art to understand the invention for various embodiments and with various modifications as are suited to particular intended uses.

[0053] refer to figure 1 , The detection system for high-throughput combined material chips provided in this embodiment includes an X-ray emitting device 1 , a sample stage 2 , a control device 3 and a data processing device 4 . The X-ray emitting device 1 is used to emit X-rays to the samples 51 of the high-throughput composite material chip array 5 , and the high-throughput composite material chip array 5 includes a pluralit...

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Abstract

The invention provides a detection system and a detection method for high-flux combined material chips. The detection method comprises the following steps of adjusting the position of a correction light source, thereby enabling coordinates of a light spot center of the correction light source to coincide with coordinates of a light spot center of an X-ray emitting device; controlling a sample table to move a high-flux combined material chip array by a control device, thereby enabling coordinates of a first sample center of the high-flux combined material chip array to coincide with the coordinates of the light spot center of the correction light source; controlling the sample table to move the high-flux combined material chip array by the control device, thereby enabling X rays emitted bythe X-ray emitting device to sequentially come to a sample of the high-flux combined material chip array; and sequentially acquiring measurement light beams diffracted by the sample of the high-flux combined material chip array and analyzing the measurement light beams through a data processing device. The detection system and the detection method can realize automatic, quick and effective detection of the sample of the high-flux combined material chip array.

Description

technical field [0001] The invention relates to the technical field of X-ray diffraction, in particular to a detection system and a detection method of a high-throughput combined material chip. Background technique [0002] The research and development of new materials is the foundation and forerunner of the national economy and national defense construction, and its research and development speed often becomes the decisive factor in the development of high-tech products. The traditional material research method characterized by trial and error is time-consuming and laborious, which greatly restricts the speed of material innovation. High-throughput combined material chip synthesis technology, using coating and masking technology to form multiple arrays of discrete component samples through multiple masks, to achieve high-throughput combined material chip preparation, to exponentially speed up the preparation of new materials, thereby accelerating The synthesis and screenin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N23/20
CPCG01N23/20008
Inventor 茹占强宋贺伦朱煜宋盛星张耀辉
Owner SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI