Aberration compensation device and method, lithography projection objective lens and aberration compensation method thereof

Abstract

The invention discloses an aberration compensation device and method, a photolithographic projection objective and an aberration compensation method adopting the photolithographic projection objective. The aberration compensation device is used for performing aberration compensation and correction on an optical imaging system and comprises a magnetorheological fluid reflector, a magnetic field generator for adjusting the magnetorheological fluid reflector, a wavefront detector and a computer controller connected with the wavefront detector, and the wavefront detector and the magnetorheologicalfluid reflector are sequentially arranged in the optical imaging system along the optical path. The magnetorheological fluid reflector is arranged, a reflector surface type is changed by changing theposition of a magnet in magnetorheological fluid, so that image quality compensation is realized, and furthermore, increase of any aberration can be avoided while all aberrations are compensated; with the selection of the magnetorheological fluid reflector, the shape of the reflector can be changed by adjusting the position of the magnet in the magnetorheological fluid, then any new high-order Zernike compensation surface type is generated, and crosstalk influence is avoided.

Description

technical field [0001] The invention relates to aberration compensation, in particular to an aberration compensation device and method, a lithographic projection objective lens and an aberration compensation method thereof. Background technique [0002] At present, in the field of semiconductor packaging, the rapid development of semiconductor manufacturing and packaging integration technology has put forward higher requirements for the lithography objective lens for manufacturing integrated circuit chips. Only when the optical imaging system used for projection exposure has a good image quality compensation capability can the image quality of the exposure area during chip preparation meet the requirements. The size of integrated circuit chips is getting smaller, which requires the resolution and imaging quality of lithographic projection objective lenses to be continuously improved. Therefore, the aberration index of lithographic projection objective lenses needs to be cont...

AI Technical Summary

Problems solved by technology

However, due to the large temperature difference, it is very difficult to control

[0006] Two: The traditional form of image quality compensation is to compensate the thermal effect by selecting a compensator and a movable lens, but the ability of the movable lens to compensate for asymmetric aberration is poor, and the image quality items that can be compensated are limited and cannot meet the requirements. Ability to compensate for all aberrations

The control of the mirror shape is through mechanical drive (piezoelectric drive) and real-time position sensor detection, accurate and fast response aberration control, but many cooling devices, temperature control devices and temperature detection devices are added to this device, so the structure of the whole device is relatively complicated

[0008] Four: Different surface shapes are generated by rotating the angle of the thermal compensation group and the combination of the plate to compensate for the thermal effect, but the processing and detection of the special lens surface of the thermal compensation group is difficult

[0009] Five: The external force generated by the active deformation mechanism (ALE) drives the lens to deform, changes the surface shape of the lens, and realizes thermal effect compensation, but there are few compensation items, which are relatively limited

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