A continuous and stable liquid supply system

A stable liquid supply and liquid supply technology, applied in the pipeline system, gas/liquid distribution and storage, mechanical equipment, etc., can solve problems affecting product quality, pressure instability, etc., to improve the pass rate, save costs, and improve stability sexual effect

Active Publication Date: 2020-09-04
宁波润华全芯微电子设备有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The problem to be solved by the present invention is to provide a continuous and stable liquid supply system to overcome the problem that in the prior art there will be a large number of bubbles in the liquid supply pipeline, and the gas is compressible, which will easily cause pressure during the liquid supply switching process. Instability, defects affecting product quality

Method used

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  • A continuous and stable liquid supply system
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  • A continuous and stable liquid supply system

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Embodiment

[0028] Such as figure 1 As shown, a kind of continuous stable liquid supply system of the present invention comprises compressed air supply device 1, replenishment device 2, waste discharge device 3, liquid supply device 4 and some liquid supply tanks; Described compressed air supply device 1 and The liquid supply tank is connected, and the compressed air supply device 1 is used to supply air to the liquid supply tank; the liquid replenishment device 2 is connected to the liquid supply tank, and the liquid replenishment device 2 is used to supply air to the liquid supply tank. The liquid tank is used for rehydration; the waste discharge device 3 is connected to the liquid supply tank, and the waste discharge device 3 is used to discharge waste liquid to the liquid supply tank; the liquid supply device 4 is connected to the liquid supply tank , the liquid supply device 4 is used to supply liquid to the machine.

[0029] In this embodiment, there are two liquid supply tanks, wh...

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PUM

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Abstract

The invention provides a continuous and stable liquid supply system comprising a compressed air supply device, a liquid infusion device, a waste discharge device, a liquid supply device and a plurality of liquid supply tanks. The compressed air supply device is connected with the liquid supply tanks, and used for supplying air to a liquid supply tank. The liquid infusion device is connected with the liquid supply tank and used for infusing liquid to the liquid supply tank. The waste discharge device is connected with the liquid supply tank and used for discharging waste liquid in the liquid supply tank. The liquid supply device is connected with the liquid supply tank, and used for supplying liquid to a machine. Gas and liquid are achieved, bubbles dissolved in liquid are removed, liquid supply is stable, automatic switching is achieved, liquid is continuously supplied, the stability of the equipment liquid supply system can be improved, and company equipment competitiveness is improved. On the other hand, the client product yield is improved, the cost is saved for clients, and more values are created.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment, in particular to a continuous and stable liquid supply system. Background technique [0002] In the semiconductor manufacturing process, most of the processes are completed using chemical liquids. The effectiveness and stability of the liquid supply system are very important. Air bubbles in the liquid supply pipeline are likely to cause poor craftsmanship, reduce product yield, and increase the burden on enterprises to a certain extent. [0003] The usual liquid supply method is to use a pressure tank to press the liquid out of the pipeline and reach the process unit under the action of a certain pressure of nitrogen, but nitrogen dissolves in the liquid at room temperature through filling, dissolution and hydration When these dissolved nitrogen molecules are released in the form of tiny bubbles in the liquid supply pipeline, it will seriously affect the process stability of the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F17D1/12F17D1/08F17D3/01
CPCF17D1/08F17D1/12F17D3/01
Inventor 傅立超魏子尧
Owner 宁波润华全芯微电子设备有限公司
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