Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Control method, substrate management controller and control system

A management controller and substrate management technology, applied in the direction of software deployment, etc., can solve the problems of poor BMC stability, BMC inoperability, slow response, etc., to improve stability, reduce uncontrollable management of multiple devices, and improve abnormal problems Effect

Active Publication Date: 2019-05-17
LENOVO (BEIJING) CO LTD
View PDF15 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] BMC (Baseboard Management Controller, baseboard management controller), as the remote management controller of the execution server, can control multiple devices, and when any device in the multiple devices is in the shutdown state, BMC can monitor the device, for example To upgrade the firmware of the device and view the data in the device, it is precisely because the BMC can monitor multiple devices in various aspects that the BMC becomes more powerful and the stability of the BMC becomes worse. For example, BMC not working or responding slowly

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Control method, substrate management controller and control system
  • Control method, substrate management controller and control system
  • Control method, substrate management controller and control system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042]Currently, the BMC can monitor the BMC through the built-in watchdog technology. The watchdog technology continuously monitors the running time of the program in the BMC. If the running time of the program is detected to exceed the preset time, it is determined that the BMC is in an endless loop. At this time, the control program is forced to return to the preset error interface, but this method still makes the BMC unable to operate or respond slowly.

[0043] For this reason, the embodiment of the present application provides a control system for solving this problem. The structure diagram of the control system is as follows figure 1 As shown, it may include: at least one local BMC10 and at least one remote BMC20, wherein each local BMC10 in at least one local BMC10 controls and manages multiple devices, and the multiple devices can be the same type of device or different types of devices, and For each local BMC, there may be overlap between multiple devices controlled ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a control method, a substrate management controller and a control system. The working state of the other baseboard management controller is monitored through one of the local baseboard management controller and the remote baseboard management controller; and if the monitored party is in the abnormal working state, a control instruction is sent to the monitored party throughmonitoring to control and improve the abnormal problem of the monitored party, so that the automatic monitoring and the automatic improvement of the abnormal problem of the other baseboard managementcontroller are realized through one baseboard management controller. If the baseboard management controller serving as the monitored party is the local baseboard management controller, the abnormal problem of the local substrate management controller can be improved in time, so that the stability of the local baseboard management controller is improved, the higher the stability of the local baseboard management controller is, the more stable the operation of the local baseboard management controller is, and the situation that multiple devices cannot be controlled and managed due to abnormityof the local baseboard management controller is reduced.

Description

technical field [0001] The present application belongs to the technical field of equipment monitoring, and more specifically relates to a control method, a substrate management controller and a control system. Background technique [0002] BMC (Baseboard Management Controller, baseboard management controller), as the remote management controller of the execution server, can control multiple devices, and when any device in the multiple devices is in the shutdown state, BMC can monitor the device, for example To upgrade the firmware of the device and view the data in the device, it is precisely because the BMC can monitor multiple devices in various aspects that the BMC becomes more powerful and the stability of the BMC becomes worse. For example, BMC not working or responding slowly. Contents of the invention [0003] In view of this, the purpose of the present application is to disclose a control method, a baseboard management controller and a control system for improving...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F8/65
Inventor 王军
Owner LENOVO (BEIJING) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com