Unlock instant, AI-driven research and patent intelligence for your innovation.

Plasma processing device

A processing device and plasma technology, applied in the field of ion processing, can solve the problems of low processing efficiency, limited application range, inability to adapt to different shapes and types of products, etc., and achieve the effect of strong adaptability and high processing efficiency

Pending Publication Date: 2019-08-20
深圳市诚峰智造有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Existing plasma processing devices have certain disadvantages, such as not being able to process the products to be processed in one-time and all-round way, requiring multiple adjustments to the placement of the products, resulting in low processing efficiency; and being unable to adapt to products of different shapes and types, limit its scope of application

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Plasma processing device
  • Plasma processing device
  • Plasma processing device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Please refer to Figure 1 to Figure 3 , Embodiment 1 of the present invention is:

[0031] A plasma processing device, such as figure 1 As shown, it includes a spray gun mechanism 1, a frame 2 and a fixing mechanism 3 for fixing the product 4 to be processed. The spray gun mechanism 1 and the fixing mechanism 3 are fixedly arranged on the frame 2 respectively, and the spray gun mechanism 1 It is arranged above the fixing mechanism 3 . In this embodiment, the number of the fixing mechanisms 3 is at least two, and at least two of the fixing mechanisms 3 are arranged on the frame 2 at intervals.

[0032] Such as figure 2 As shown, the spray gun mechanism 1 includes a plasma spray gun 11, a fixing member 12 and a first driving member 13, the plasma spray gun 11 is fixedly arranged on the fixing member 12, and the first driving member 13 drives the first The fixing part 12 moves along the Z-axis direction. The plasma processing apparatus also includes a second driving ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a plasma processing device. The plasma processing device comprises a spray gun mechanism, a rack and a fixing mechanism configured to fix a product to be processed, the spray gun mechanism and the fixing mechanism are fixedly arranged on the rack, the spray gun mechanism is arranged at the upper portion of the fixing mechanism, the fixing mechanism comprises a base, a rotation piece and an adsorption piece for adsorbing the product to be processed, the rotation piece is rotationally arranged relative to the base, the adsorption piece is rotationally arranged relative tothe rotation piece, and an inclined angle is formed between the rotation track of the rotation piece relative to the base and the rotation track of the adsorption piece relative to the rotation piece. The plasma processing device can process products to be processed with different shapes and types, and can process the different positions of the same product to be processed with no need for repeated regulation of the position of the product to be processed, and therefore, the processing efficiency is high, and the adaptability is high.

Description

technical field [0001] The invention relates to the technical field of plasma processing, in particular to a plasma processing device. Background technique [0002] Plasma processing devices rely on electric energy to generate high-voltage, high-frequency energy. These energies are activated and controlled in the spray gun to generate low-temperature plasma in the glow discharge. physical and chemical changes. Existing plasma processing devices have certain disadvantages, such as not being able to process the products to be processed in one-time and all-round way, requiring multiple adjustments to the placement of the products, resulting in low processing efficiency; and being unable to adapt to products of different shapes and types, limited its scope of application. Contents of the invention [0003] The technical problem to be solved by the present invention is to provide a plasma processing device with high processing efficiency and strong adaptability. [0004] In ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/32
CPCH01J37/32715
Inventor 蔡卫罗弦卢永锦史健勇孙晓华
Owner 深圳市诚峰智造有限公司