Susceptor adjusters, chambers and semiconductor processing equipment

Abstract

The base adjustment device, chamber and semiconductor processing equipment provided by the present invention, the device includes a lifting support, a main adjustment assembly, a first auxiliary adjustment assembly and a second auxiliary adjustment assembly, the lifting support is connected with the lifting mechanism of the base; the main adjustment The assembly, the first auxiliary adjustment assembly and the second auxiliary adjustment assembly fix the lifting bracket under the chamber. The arrangement of the three is: the center of the orthographic projection on the base is connected to form a triangle, and the center of the triangle is connected to the base The centers overlap each other; the main adjustment assembly is used to drive the lifting bracket to move along the first horizontal direction or the second horizontal direction, and the first horizontal direction and the second horizontal direction are perpendicular to each other; the first auxiliary adjustment assembly and the second auxiliary adjustment assembly are used for Drive the lifting bracket to rise or fall. The base adjusting device provided by the present invention can adjust the levelness and the horizontal position of the base, and at the same time avoid the mutual interference between the adjustment of the levelness and the adjustment of the horizontal position, thereby reducing the adjustment difficulty and improving the adjustment accuracy.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a base adjusting device, a chamber and semiconductor processing equipment. Background technique [0002] In recent years, semiconductor-related equipment has developed rapidly, involving devices such as integrated circuits, solar panels, flat-panel displays, microelectronics, and light-emitting diodes. make. Therefore, the reliability and stability of film-forming equipment, which is the core of semiconductor equipment, is an important factor in determining the quality and yield of thin-film growth of semiconductor devices. [0003] Usually, a base for placing a substrate is provided in the reaction chamber of the semiconductor film forming equipment, and the base is generally controlled by a lifting mechanism to reach the process position. However, the current semiconductor equipment has the problem of uneven film formation. The reasons are as follows: Firs...

AI Technical Summary

Problems solved by technology

Therefore, when adjusting the parallelism between the base 4 and the air intake device 5, it will inevitably affect the concentricity of the adjustment base 4 and the air intake device 5, resulting in mutual interference between leveling and concentricity, which is very demanding for operators. high and difficult to achieve

Images