Target material verticality detection device

Abstract

The invention discloses a target material verticality detection device, comprising a pedestal and a light-transmitting table, a lifting mechanism is mounted between the two sides of the pedestal and the light-transmitting table, multiple illuminating lamps are mounted on the pedestal, a fixed locating block is mounted between two adjacent sides of the top of the light-transmitting table, fixed plates are respectively mounted at the other two adjacent sides of the top of the light-transmitting table, guide holes are formed in the two ends of each fixed plate, a guide rod is sheathed inside eachguide hole, one end of each guide rod is connected with a movable locating block, a push cylinder is mounted on the outer wall of each fixed plate, and a push rod of each push cylinder is connected with the outer wall of the movable locating block. Two adjacent sides of a target material cling two inner walls of the fixed locating block, the push cylinders push the movable locating block, and themovable locating block locates and compresses the other two adjacent sides of the target material, so that target materials in different sizes can be fixed; lights of the illuminating lamps irradiateto the four sides of the target material from the bottom of the light-transmitting table, so that the target material can be conveniently observed by human eyes; the light-transmitting table is driven to go up and down by virtue of the lifting mechanism, and height of the light-transmitting table can be regulated, so that space between the target material and the illuminating lamps can be conveniently controlled, and target materials at different heights can be conveniently detected and observed.

Description

technical field [0001] The invention relates to the technical field of targets, in particular to a target verticality detection device. Background technique [0002] The target is a sputtering source that forms various functional thin films on the substrate through magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate process conditions. Common targets have cylindrical and rectangular structures. For For rectangular targets, it is necessary to detect the verticality of the outer wall of the target after the target is manufactured. The current detection method is to directly place the target on the detection table and use measuring tools for detection. The target is easy to move during detection. And it is often observed with the help of light such as a desk lamp above the detection platform. The head is easy to block the light during observation, resulting in a dark line of sight at the observation point, and the outer walls around t...

AI Technical Summary

Problems solved by technology

[0002] The target is a sputtering source that forms various functional thin films on the substrate through magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate process conditions. Common targets have cylindrical and rectangular structures. For For rectangular targets, it is necessary to detect the verticality of the outer wall of the target after the target is manufactured. The current detection method is to directly place the target on the detection table and use measuring tools for detection. The target is easy to move during detection. And it is often observed with the help of light such as a desk lamp above the detection platform. The head is easy to block the light during observation, resulting in a dark line of sight at the observation point, and the outer walls around the target cannot be illuminated by the above desk lamp, which is not conducive to human observation. Therefore, we propose a target verticality detection device to solve the above problems

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