Plasma activating fog preparing device

A plasma and preparation device technology, which is applied in the field of plasma activated mist preparation device, can solve the problems of high ozone concentration, inability to take into account the depth of action and plasma concentration, etc., and achieve the effects of reducing ozone concentration, improving activation efficiency, and reducing costs

A plasma and preparation device technology, which is applied in the field of plasma activated mist preparation device, can solve the problems of high ozone concentration, inability to take into account the depth of action and plasma concentration, etc., and achieve the effects of reducing ozone concentration, improving activation efficiency, and reducing costs

CN110693692AInactive Publication Date: 2020-01-17HUAZHONG UNIV OF SCI & TECH

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  • Plasma activating fog preparing device
  • Plasma activating fog preparing device
  • Plasma activating fog preparing device

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Embodiment Construction

[0034] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.

[0035] Such as figure 1 As shown, the present invention proposes a plasma activated mist preparation device, including: a liquid atomization module, a gas output module, a high voltage power supply and a gas ionization atomization module; the liquid atomization module includes an ultrasonic atomizer 4, a liquid storage tank 5 and fan 6; the ultrasonic nebulizer 4 and fan 6 are located at the bo...

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Abstract

The invention discloses a plasma activating fog preparing device, and belongs to the field of disinfection treatment. The plasma activating fog preparing device comprises a liquid atomizing module, agas output module, a high-voltage power source and a gas ionizing and atomizing module, wherein the liquid atomizing module is used for atomizing liquid and inputting the atomized liquid to the gas ionizing and atomizing module; the gas output module is used for providing working gas for the gas ionizing and atomizing module; the gas ionizing and atomizing module is used for ionizing the working gas to produce plasma active particles under the effect of the high-voltage power source; and plasma active particles are absorbed and adhered by atomized droplets to form plasma activating fog. According to the plasma activating fog preparing device disclosed by the invention, the gaseous phase plasma active particles are easier to absorb by the droplets, and are adhered to the surfaces of the droplets to form plasma activating fog; besides, the plasma activating fog can quickly absorb ozone, oxygen atoms and the like to generate liquid phase active particles including H2O2, OH and the like, so that high-density gaseous-liquid mixing phase active particles are generated, the activating efficiency is notably improved, and the ozone concentration is reduced.

Description

technical field [0001] The invention belongs to the field of disinfection treatment, and more specifically relates to a plasma activated mist preparation device. Background technique [0002] Plasma is a macroscopically neutral substance, which contains a large number of charged particles and neutral particles, and is the fourth substance in the universe besides solid, liquid and gas. According to the relationship between electron temperature and ion temperature in plasma, plasma can be divided into three types: high temperature plasma, thermal plasma and low temperature plasma. When the electron temperature is completely equal to the ion temperature, it is a high-temperature plasma, and the overall temperature of the plasma can reach 10 9 K; when the electron temperature is only locally equal to the ion temperature, it is a hot plasma, and the plasma temperature is 10 3 K~10 4 K; when the electron temperature is completely lower than the ion temperature, it is a low-temp...

Claims

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Application Information

Patent Timeline
17 Jan 2020
Publication
CN110693692A
IPC
A61H33/02; A61M11/00
CPC
A61H33/02; A61H2201/50; A61H2201/5058; A61H2201/5089; A61M11/005; A61M11/001
Inventors
张舒; 刘大伟