The invention discloses a method for adjusting constant
plasma concentration, which comprises the following steps of: 1, setting parameters, 2, acquiring data, 3,
processing the data, calculating a compensated heating module control PWM (
Pulse Width Modulation)
signal Hcomp, calculating the compensated
plasma concentration n, 4, scanning the frequency of an
ion tube, determining a
resonance point through a full-bridge current, and calculating the
plasma concentration n. The
ion tube and the
transformer resonate at a
resonance point to adjust the working frequency of the full-
bridge circuit; and 5, adjusting the temperature of the heating module according to the data collected by the temperature and
humidity module to adjust the
plasma concentration generated by the
ion tube, and / or adjusting the full-bridge amplitude of the full-
bridge circuit through the booster circuit to adjust the
plasma concentration generated by the ion tube. The
plasma concentration value after compensation is obtained in real time through the plasma sensor, and the generator MCU can adjust the working frequency of the full-
bridge circuit, so that the ion tube can output plasma constantly, and automatic adjustment of the plasma concentration is achieved.